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    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME
    1.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE SAME 审中-公开
    含有该化合物的光敏化合物和光敏树脂组合物

    公开(公告)号：WO2010093210A3

    公开(公告)日：2010-12-02

    申请号：PCT/KR2010000923

    申请日：2010-02-12

    Applicant: LG CHEMICAL LTD ,  CHO CHANG HO ,  KIM SUNG HYUN ,  KHARBASH RAISA ,  LEE KEON WOO ,  OH DONG KUNG ,  CHUNG WON JIN ,  KWAK SANG KYU ,  LEE CHANG SOON

    Inventor： CHO CHANG HO ,  KIM SUNG HYUN ,  KHARBASH RAISA ,  LEE KEON WOO ,  OH DONG KUNG ,  CHUNG WON JIN ,  KWAK SANG KYU ,  LEE CHANG SOON

    IPC: G03F7/027 ,  C07F9/572

    CPC classification number: C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

    Abstract: The present invention relates to a photoactive compound of novel structure and a photosensitive resin composition containing the same. The photoactive compound according to the present invention has high sensitivity with efficient absorption of a UV light source by having a nitro group and a phosphonate structure. In addition, the photoactive compound has a residual film thickness, high mechanical strength, heat resistance, chemical resistance, and development resistance by improving solubility of a photosensitive resin composition through high compatibility with a binder resin and a phosphonate structure. Therefore, the photosensitive resin composition has an advantage of curing a material for column spacer, an overcoat, and the passivation of a liquid crystal display device, as well as high temperature process characteristics.

    Abstract translation: 本发明涉及新型结构的光活性化合物和含有其的光敏树脂组合物。 本发明的光活性化合物通过具有硝基和膦酸酯结构而高效地吸收紫外光源而具有高灵敏度。 此外，光敏化合物通过与粘合剂树脂和膦酸酯结构的高相容性改善光敏树脂组合物的溶解性而具有残余膜厚度，高机械强度，耐热性，耐化学性和耐显影性。 因此，感光性树脂组合物具有使柱状间隔物用材料，保护膜，液晶显示装置的钝化固化的优点以及高温处理特性。

    PHOTOACTIVE COMPOUND AND A LIGHT-SENSITIVE RESIN COMPOSITION COMPRISING SAME
    3.
    发明申请
    PHOTOACTIVE COMPOUND AND A LIGHT-SENSITIVE RESIN COMPOSITION COMPRISING SAME 审中-公开
    光敏化合物和包含该化合物的光敏树脂组合物

    公开(公告)号：WO2013018978A8

    公开(公告)日：2013-10-24

    申请号：PCT/KR2012003766

    申请日：2012-05-14

    Applicant: LG CHEMICAL LTD ,  CHO CHANGHO ,  CHUNG WON JIN ,  KHARBASH RAISA ,  KIM SUNGHYUN ,  CHOI DONGCHANG ,  LEE SANG CHUL ,  KIM HAN SOO ,  HEO YOON HEE ,  KIM SUNHWA

    Inventor： CHO CHANGHO ,  CHUNG WON JIN ,  KHARBASH RAISA ,  KIM SUNGHYUN ,  CHOI DONGCHANG ,  LEE SANG CHUL ,  KIM HAN SOO ,  HEO YOON HEE ,  KIM SUNHWA

    IPC: G03F7/004 ,  G03F7/027

    CPC classification number: G03F7/0045 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388

    Abstract: The present invention relates to a photoactive compound having a novel structure and to a light-sensitive resin composition comprising same. The photoactive compound according to the present invention not only has outstanding sensitivity because of effective absorption with respect to a UV light source due to the inclusion of a nitro group and phosphonate structure, but also has outstanding residual film thickness, mechanical strength, heat resistance, chemical resistance and development resistance due to improved solubility of the light-sensitive resin composition because of outstanding compatibility of the phosphonate structure and a binder resin. Consequently, the light-sensitive resin composition of the present invention is not only advantageous in the curing of liquid-crystal-display column spacers, overcoats, passivation materials and the like but is also advantageous in terms of high-temperature processing characteristics as well.

    Abstract translation: 本发明涉及具有新结构的光活性化合物，并涉及包含其的光敏树脂组合物。 本发明的光活性化合物不仅具有优异的灵敏度，因为由于包含硝基和膦酸酯结构而对紫外光源有效吸收，而且具有优异的残余膜厚度，机械强度，耐热性， 耐化学性和耐显影性，这是因为膦酸酯结构和粘合剂树脂具有优异的相容性，因此提高了光敏树脂组合物的溶解性。 因此，本发明的光敏树脂组合物不仅有利于液晶显示器柱状间隔件，外涂层，钝化材料等的固化，而且在高温处理特性方面也是有利的。

    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
    4.
    发明申请
    PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 审中-公开
    含有该化合物的光敏化合物和光敏树脂组合物

    公开(公告)号：WO2009125940A2

    公开(公告)日：2009-10-15

    申请号：PCT/KR2009001660

    申请日：2009-04-01

    Applicant: LG CHEMICAL LTD ,  CHO CHANG HO ,  KIM SUNG HYUN ,  KHARBASH RAISA ,  LEE KEON WOO ,  KWAK SANG KYU ,  OH DONG KUNG ,  LEE CHANG SOON ,  MIN KYOUNG HOON

    Inventor： CHO CHANG HO ,  KIM SUNG HYUN ,  KHARBASH RAISA ,  LEE KEON WOO ,  KWAK SANG KYU ,  OH DONG KUNG ,  LEE CHANG SOON ,  MIN KYOUNG HOON

    IPC: C07D413/12 ,  G03F7/027

    CPC classification number: C07D405/12 ,  G03F7/031

    Abstract: The present invention relates to a photoactive compound having a novel structure expressed in Chemical Formula 1 and to a photosensitive resin composition comprising the same. The photoactive compound of the present invention exhibits high efficiency in absorbing ultraviolet rays and generating radicals, and in photopolymerization with an unsaturated group. The photosensitive resin composition comprising the photoactive compound of the invention exhibits improved sensitivity through efficient absorption of ultraviolet rays, and improved residual film thickness, mechanical strength, heat resistance, chemical resistance and development resistance. Therefore, the photosensitive resin composition of the present invention is advantageous in hardening a column spacer, overcoat, and passivation material of a liquid crystal display, and also in a high temperature process.

    Abstract translation: 本发明涉及具有化学式1所示的新型结构的光活性化合物以及包含其的光敏树脂组合物。 本发明的光活性化合物在吸收紫外线和产生自由基以及用不饱和基团进行光聚合方面表现出高效率。 包含本发明的光活性化合物的光敏树脂组合物通过有效吸收紫外线而显示出改善的灵敏度，并且改善了残余膜厚度，机械强度，耐热性，耐化学性和显影性。 因此，本发明的光敏树脂组合物有利于硬化液晶显示器的柱状间隔物，外涂层和钝化材料，并且还用于高温过程。

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