公开(公告)号：WO2007136186A1

公开(公告)日：2007-11-29

申请号：PCT/KR2007/002389

申请日：2007-05-16

Applicant: DNF CO., LTD. ,  KIM, Myoung Won ,  KIM, Jin Dong ,  NA, Yong Hwan

Inventor： KIM, Myoung Won ,  KIM, Jin Dong ,  NA, Yong Hwan

IPC: C07F5/06

CPC classification number: C07F5/069

Abstract: The present invention relates to synthesis method of a precursor compound to deposit aluminum films on the substrate by chemical vapor deposition, and it provides the synthesis method of a compound defined as Formula 1 below. H 2 AlBH 4 :N (CH 3 ) 3

Abstract translation: 本发明涉及通过化学气相沉积在基材上沉积铝膜的前体化合物的合成方法，并提供了下文定义的化合物的合成方法。 N 2（CH 3）3 H 2 N 2 CH 3

公开(公告)号：WO2007136184A1

公开(公告)日：2007-11-29

申请号：PCT/KR2007/002377

申请日：2007-05-15

Applicant: DNF Co., Ltd. ,  KIM, Myoung Won ,  KIM, Jin Dong ,  NA, Yong Hwan

Inventor： KIM, Myoung Won ,  KIM, Jin Dong ,  NA, Yong Hwan

IPC: C07F5/06

CPC classification number: C07F5/069

Abstract: The present invention relates to a precursor compound used for vapor -depositing an aluminum film on a substrate by means of chemical vapor deposition, and a process for preparing the compound. The present invention provides an organometallic complex defined by Chemical Formula 1, and a process for preparing the same. H 2 AlBH 4 : L n In the Formula, L is a Lewis base, an aminic organic compound which can provide unshared electron pair to the center of aluminum metal, such as a heterocyclic amine or an alkylamine, and n is an integer of 1 or 2.

Abstract translation: 本发明涉及用于通过化学气相沉积将铝膜气相沉积在基材上的前体化合物及其制备方法。 本发明提供由化学式1定义的有机金属络合物及其制备方法。 在下式中，L是路易斯碱，可以提供未共享的电子对的氨基有机化合物，其中R 1，R 2，R 3，R 4，R 5， 铝金属的中心，例如杂环胺或烷基胺，n为1或2的整数。