公开(公告)号：WO2014031119A1

公开(公告)日：2014-02-27

申请号：PCT/US2012/052022

申请日：2012-08-23

Applicant: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY ,  TOKUYAMA CORPORATION ,  HEXATECH, INC. ,  KOUKITU, Akinori ,  KUMAGAI, Yoshinao ,  NAGASHIMA, Toru ,  KINOSHITA, Toru ,  KUBOTA, Yuki ,  DALMAU, Rafael F. ,  XIE, Jinqiao ,  MOODY, Baxter F. ,  SCHLESSER, Raoul ,  SITAR, Zlatko

Inventor： KOUKITU, Akinori ,  KUMAGAI, Yoshinao ,  NAGASHIMA, Toru ,  KINOSHITA, Toru ,  KUBOTA, Yuki ,  DALMAU, Rafael F. ,  XIE, Jinqiao ,  MOODY, Baxter F. ,  SCHLESSER, Raoul ,  SITAR, Zlatko

IPC: C30B25/10 ,  C30B25/14 ,  C30B29/40 ,  H01L33/32

CPC classification number: C30B25/20 ,  C01B21/072 ,  C01P2006/60 ,  C30B25/14 ,  C30B25/165 ,  C30B29/403 ,  H01L33/0075 ,  H01L33/02 ,  H01L33/18 ,  H01L33/32 ,  Y10T428/26

Abstract: The invention provides highly transparent single crystalline AlN layers as device substrates for light emitting diodes in order to improve the output and operational degradation of light emitting devices. The highly transparent single crystalline AlN layers have a refractive index in the a-axis direction in the range of 2.250 to 2.400 and an absorption coefficient less than or equal to 15 cm-1 at a wavelength of 265 nm. The invention also provides a method for growing highly transparent single crystalline AlN layers, the method including the steps of maintaining the amount of Al contained in wall deposits formed in a flow channel of a reactor at a level lower than or equal to 30 % of the total amount of aluminum fed into the reactor, and maintaining the wall temperature in the flow channel at less than or equal to 1200°C.

Abstract translation: 本发明提供了高透明度的单晶AlN层作为用于发光二极管的器件衬底，以便改善发光器件的输出和操作劣化。 高透明度的单晶AlN层在波长265nm下的a轴方向的折射率在2.250〜2.400的范围内，吸收系数小于或等于15cm -1。 本发明还提供一种生长高透明度单晶AlN层的方法，该方法包括以下步骤：将在反应器流道中形成的壁沉积物中所含的Al的量保持在低于或等于30％ 供给到反应器中的铝的总量，以及将流动通道中的壁温度维持在小于或等于1200℃。

公开(公告)号：WO2005009884A1

公开(公告)日：2005-02-03

申请号：PCT/JP2004/010372

申请日：2004-07-14

Applicant: TOSHIBA ELEVATOR KABUSHIKI KAISHA ,  MURAKAMI, Shin ,  KINOSHITA, Toru

Inventor： MURAKAMI, Shin ,  KINOSHITA, Toru

IPC: B66B13/30

CPC classification number: B66B13/308 ,  B66B13/30

Abstract: A sealing device for an elevator door includes a doorway member (10), doors (6a, 6b), a movable member (32), a push-down mechanism (36, 37) and a sealing mechanism (30). The doorway member (10) is provided for a gate. The doors (6a, 6b) open or close along the doorway member (10). The movable member (32) is set horizontally and provided to be movable in a vertical direction in the doorway member (10), and it is urged upwards by an urging unit (35). The push-down mechanism (36, 37) pushes down the movable member (32) against the force of the urging unit (35) just before the doors (6a, 6b) are closed. The sealing mechanism (30) is kept non-contact with the doors (6a, 6b) while they are moving, and seals the gap between the doors (6a, 6b) and the doorway member (10) as it is brought into contact with upper section of the doors (6a, 6b) when the movable member (32) is pushed down by the push-down mechanism (36, 37).

Abstract translation: 一种用于电梯门的密封装置，包括门口部件（10），门（6a，6b），可移动部件（32），下推机构（36,37）和密封机构（30）。 门口构件（10）设置用于门。 门（6a，6b）沿着门口构件（10）打开或关闭。 可移动构件（32）水平地设置成能够在门口构件（10）中沿垂直方向移动，并且由推动单元（35）向上推动。 在门（6a，6b）关闭之前，下推机构（36,37）抵抗推动单元（35）的力抵抗可动构件（32）。 密封机构（30）在移动时与门（6a，6b）保持不接触，并且当与门（6a，6b）接触时密封门（6a，6b）和门口构件（10）之间的间隙 当可动构件（32）被下推机构（36,37）推下时，门（6a，6b）的上部。

公开(公告)号：WO1991004994A1

公开(公告)日：1991-04-18

申请号：PCT/JP1990001266

申请日：1990-10-02

Applicant: MITSUI PETROCHEMICAL INDUSTRIES, LTD. ,  NAKABAYASHI, Nobuo ,  ISHIHARA, Kazuhiko ,  YAMAMOTO, Takashi ,  KINOSHITA, Toru

Inventor： MITSUI PETROCHEMICAL INDUSTRIES, LTD.

IPC: C08F220/12

CPC classification number: C08F220/38 ,  A61K6/0029 ,  C08F212/14 ,  C08F220/12 ,  A61K6/0023 ,  C08L33/10 ,  C08L33/08 ,  C08L25/08 ,  C08L33/068 ,  C08L33/26

Abstract: An acrylate copolymer consisting of repeating units derived from a (meth)acrylic ester compound and repeating units derived from a vinyl compound having an -SO3R group (wherein R represents hydrogen or lower alkyl) or an acceptable salt group thereof, wherein at least part of the ester groups of said (meth)acrylic ester compound are substituted by a group having repeating units derived from a (meth)acrylic ester. The invention also relates to a method of producing the copolymer and its use wherein the adhesiveness of the copolymer is utilized.