公开(公告)号：WO2007123696A2

公开(公告)日：2007-11-01

申请号：PCT/US2007007932

申请日：2007-03-29

Applicant: TOKYO ELECTRON LTD ,  LI SHIFANG ,  BAO JUNWEI ,  VUONG VI

Inventor： LI SHIFANG ,  BAO JUNWEI ,  VUONG VI

IPC: G01J4/02

CPC classification number: G01B11/24 ,  G03F7/70625

Abstract: To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.

Abstract translation: 为了确定半导体晶片上的管芯内结构的一个或多个特征，在要形成在测试焊盘上的测试结构的一个或多个特征与相应的管芯内结构的一个或多个特征之间确定相关性。 获得测量结果测得的衍射信号。 使用测量的衍射信号确定测试结构的一个或多个特征。 基于测试结构的一个或多个确定的特征和确定的相关性来确定管芯内结构的一个或多个特征。

公开(公告)号：WO2007028164A3

公开(公告)日：2007-11-22

申请号：PCT/US2006034610

申请日：2006-09-05

Applicant: TOKYO ELECTRON LTD ,  LI SHIFANG ,  KOMAROV SERGUEI ,  MIYAGI MAKOTO ,  RABELLO SYLVIO ,  BAO JUNWEI ,  BISCHOFF JOERG

Inventor： LI SHIFANG ,  KOMAROV SERGUEI ,  MIYAGI MAKOTO ,  RABELLO SYLVIO ,  BAO JUNWEI ,  BISCHOFF JOERG

IPC: G01B11/24 ,  G01N21/00

CPC classification number: G01B11/24 ,  G01N21/4788

Abstract: To select a unit cell configuration for a repeating structure in optical metrology, a plurality of unit cell configurations are defined for the repeating structure. Each unit cell configuration is defined by one or more unit cell parameters. Each unit cell of the plurality of unity cell configurations differs from one another in at least one unit cell parameter. One or more selection criteria are used to select one of the plurality of unit cell configurations. The selected unit cell configuration can then be used to characterize the top-view profile of the repeating structure.

Abstract translation: 为了在光学测量中选择重复结构的单位单元配置，为重复结构定义了多个单位单元配置。 每个单位单元配置由一个或多个单位单元参数定义。 多个单位单元配置中的每个单位单元在至少一个单位单元参数中彼此不同。 使用一个或多个选择标准来选择多个单位单元配置之一。 然后可以使用所选择的单位单元配置来表征重复结构的顶视图。

公开(公告)号：WO2007103302A2

公开(公告)日：2007-09-13

申请号：PCT/US2007/005573

申请日：2007-03-05

Applicant: TOKYO ELECTRON LIMITED ,  VUONG, Vi ,  BAO, Junwei ,  LI, Shifang ,  CHEN, Yan

Inventor： VUONG, Vi ,  BAO, Junwei ,  LI, Shifang ,  CHEN, Yan

IPC: G01B11/14

CPC classification number: G01B11/24

Abstract: A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.

Abstract translation: 获得加权函数以增强在光学计量学中使用的测量的衍射信号。 为了获得加权函数，获得测量的衍射信号。 使用光度测量装置从晶片上的位置测量测量的衍射信号。 基于存在于测量的衍射信号中的噪声来定义第一加权函数。 基于测量的衍射信号的精度来定义第二加权函数。 基于测量的衍射信号的灵敏度来定义第三加权函数。 基于第一，第二和第三加权函数中的一个或多个来定义第四加权函数。

公开(公告)号：WO2011123702A1

公开(公告)日：2011-10-06

申请号：PCT/US2011/030817

申请日：2011-03-31

Applicant: TOKYO ELECTRON LIMITED ,  LI, Shifang

Inventor： LI, Shifang

IPC: G01N37/00

CPC classification number: G01B21/24 ,  G01B2210/56 ,  G03F7/705 ,  G03F7/70625

Abstract: Provided is a method and system for determining a profile of a structure using an optical metrology system that includes an optical metrology tool, an optical metrology model, and a profile extraction algorithm. The method comprises selecting a number of rays, selecting beam propagation parameters, determining beam propagation parameters, calculating total intensity and polarization of the diffraction beam, calculating a metrology output signal, and extracting profile parameters. Also provided is a method for determining profile parameters of the structure optimized to achieve accuracy targets, the method comprising: setting accuracy targets; selecting a number of rays and beam propagation parameters, measuring a diffraction signal, generating a metrology output signal, determining an adjusted metrology output signal, concurrently optimizing the optical metrology tool model and the profile model using the adjusted metrology output signal and a parameter extraction algorithm.

Abstract translation: 提供了一种用于使用包括光学测量工具，光学计量学模型和轮廓提取算法的光学测量系统来确定结构的轮廓的方法和系统。 该方法包括选择多个光线，选择光束传播参数，确定光束传播参数，计算衍射光束的总强度和极化，计算测量输出信号，以及提取轮廓参数。 还提供了一种用于确定优化以实现精度目标的结构的轮廓参数的方法，所述方法包括：设置精度目标; 选择多个光束和光束传播参数，测量衍射信号，产生测量输出信号，确定调整的测量输出信号，同时使用调整的测量输出信号和参数提取算法同时优化光学计量学工具模型和简档模型 。

公开(公告)号：WO2007028164A2

公开(公告)日：2007-03-08

申请号：PCT/US2006/034610

申请日：2006-09-05

Applicant: TIMBRE TECHNOLOGIES, INC. ,  LI, Shifang ,  KOMAROV, Serguei ,  MIYAGI, Makoto ,  RABELLO, Sylvio ,  BAO, Junwei ,  BISCHOFF, Joerg

Inventor： LI, Shifang ,  KOMAROV, Serguei ,  MIYAGI, Makoto ,  RABELLO, Sylvio ,  BAO, Junwei ,  BISCHOFF, Joerg

IPC: G01B11/24

CPC classification number: G01B11/24 ,  G01N21/4788

Abstract: To select a unit cell configuration for a repeating structure in optical metrology, a plurality of unit cell configurations are defined for the repeating structure. Each unit cell configuration is defined by one or more unit cell parameters. Each unit cell of the plurality of unity cell configurations differs from one another in at least one unit cell parameter. One or more selection criteria are used to select one of the plurality of unit cell configurations. The selected unit cell configuration can then be used to characterize the top-view profile of the repeating structure.

Abstract translation: 为了选择用于光学计量中的重复结构的单位单元配置，针对重复结构定义多个单位单元配置。 每个单位单元配置由一个或多个单位单元参数定义。 多个单元配置中的每个单元单元在至少一个单元单元参数中彼此不同。 使用一个或多个选择标准来选择多个单位单元配置中的一个。 然后可以使用选定的单元格配置来表征重复结构的俯视图轮廓。

公开(公告)号：WO2007103302A3

公开(公告)日：2008-08-28

申请号：PCT/US2007005573

申请日：2007-03-05

Applicant: TOKYO ELECTRON LTD ,  VUONG VI ,  BAO JUNWEI ,  LI SHIFANG ,  CHEN YAN

Inventor： VUONG VI ,  BAO JUNWEI ,  LI SHIFANG ,  CHEN YAN

IPC: G06F15/00 ,  G01B11/14

CPC classification number: G01B11/24

Abstract: A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.

Abstract translation: 获得加权函数以增强光学计量学中使用的测量衍射信号。 为了获得加权函数，获得测量的衍射信号。 使用光度测量装置从晶片上的位置测量测量的衍射信号。 基于存在于测量的衍射信号中的噪声来定义第一加权函数。 基于测量的衍射信号的精度来定义第二加权函数。 基于测量的衍射信号的灵敏度来定义第三加权函数。 基于第一，第二和第三加权函数中的一个或多个来定义第四加权函数。

公开(公告)号：WO2007112022A2

公开(公告)日：2007-10-04

申请号：PCT/US2007/007292

申请日：2007-03-20

Applicant: TIMBRE TECHNOLOGIES, INC. ,  JIN, Wen ,  DODDI, Srinivas ,  LI, Shifang

Inventor： JIN, Wen ,  DODDI, Srinivas ,  LI, Shifang

IPC: G01B11/14

CPC classification number: G01B11/24

Abstract: The number of diffraction orders to use in generating simulated diffraction signals for a two-dimensional structure in optical metrology is selected by generating a first simulated diffraction signal using a first number of diffraction orders and a hypothetical profile of the two-dimensional structure. A second simulated diffraction signal is generated using a second number of diffraction orders using the same hypothetical profile used to generate the first simulated diffraction signal, where the first and second numbers of diffraction orders are different. The first and second simulated diffraction signals are compared. Based on the comparison of the first and second simulated diffraction signals, a determination is made as to whether to select the first or second number of diffraction orders.

Abstract translation: 通过使用第一数量的衍射级和二维结构的假设曲线生成第一模拟衍射信号来选择用于在光学测量中产生用于二维结构的模拟衍射信号的衍射级数。 使用第二数量的衍射级使用用于产生第一和第二数量的衍射级不同的第一模拟衍射信号的相同假想轮廓来产生第二模拟衍射信号。 比较第一和第二模拟衍射信号。 基于第一和第二模拟衍射信号的比较，确定是否选择第一或第二数量的衍射级。

公开(公告)号：WO2005043600A2

公开(公告)日：2005-05-12

申请号：PCT/US2004036413

申请日：2004-10-28

Applicant: TIMBRE TECH INC ,  BISCHOFF JOERG ,  LI SHIFANG ,  NIU XINHUI

Inventor： BISCHOFF JOERG ,  LI SHIFANG ,  NIU XINHUI

IPC: G01B11/24 ,  G01N21/956 ,  H01L20060101 ,  H01L

CPC classification number: G01N21/956

Abstract: A structure formed on a semiconductor wafer is examined by directing an incident beam at the structure at an incidence angle and a azimuth angle. The incident beam is scanned over a range of azimuth angles to obtain an azimuthal scan. The cross polarization components of diffracted beams are measured during the azimuthal scan.

Abstract translation: 通过将入射光束以入射角和方位角引导到结构上来检查在半导体晶片上形成的结构。 入射光束在一定范围的方位角上扫描以获得方位角扫描。 在方位角扫描期间测量衍射光束的交叉偏振分量。

公开(公告)号：WO2007112022A3

公开(公告)日：2008-10-16

申请号：PCT/US2007007292

申请日：2007-03-20

Applicant: TIMBRE TECH INC ,  JIN WEN ,  DODDI SRINIVAS ,  LI SHIFANG

Inventor： JIN WEN ,  DODDI SRINIVAS ,  LI SHIFANG

IPC: G01B11/14

CPC classification number: G01B11/24

Abstract: The number of diffraction orders to use in generating simulated diffraction signals for a two-dimensional structure in optical metrology is selected by generating a first simulated diffraction signal using a first number of diffraction orders and a hypothetical profile of the two-dimensional structure. A second simulated diffraction signal is generated using a second number of diffraction orders using the same hypothetical profile used to generate the first simulated diffraction signal, where the first and second numbers of diffraction orders are different. The first and second simulated diffraction signals are compared. Based on the comparison of the first and second simulated diffraction signals, a determination is made as to whether to select the first or second number of diffraction orders.

Abstract translation: 通过使用第一数量的衍射级和二维结构的假设曲线生成第一模拟衍射信号来选择用于在光学测量中产生用于二维结构的模拟衍射信号的衍射级数。 使用第二数量的衍射级使用用于产生第一和第二数量的衍射级不同的第一模拟衍射信号的相同假想轮廓来产生第二模拟衍射信号。 比较第一和第二模拟衍射信号。 基于第一和第二模拟衍射信号的比较，确定是否选择第一或第二数量的衍射级。

公开(公告)号：WO2007123696A3

公开(公告)日：2007-11-01

申请号：PCT/US2007/007932

申请日：2007-03-29

Applicant: TOKYO ELECTRON LIMITED ,  LI, Shifang ,  BAO, Junwei ,  VUONG, Vi

Inventor： LI, Shifang ,  BAO, Junwei ,  VUONG, Vi

IPC: G01N21/86 ,  G01V8/00

Abstract: To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.