公开(公告)号：WO2001090441A3

公开(公告)日：2001-11-29

申请号：PCT/CA2001/000755

申请日：2001-05-24

Applicant: SURFACE ENGINEERED PRODUCTS CORPORATION ,  WYSIEKIERSKI, Andrew, George ,  FISHER, Gary, Anthony ,  PETRONE, Sabino, Steven, Anthony ,  MANDYAM, Radhakrishna, Chakravarthy

Inventor： WYSIEKIERSKI, Andrew, George ,  FISHER, Gary, Anthony ,  PETRONE, Sabino, Steven, Anthony ,  MANDYAM, Radhakrishna, Chakravarthy

IPC: C23C26/00

Abstract: There is provided a surface alloyed component which comprises a base alloy with a diffusion barrier layer enriched in silicon and chromium being provided adjacent thereto. An enrichment pool layer is created adjacent the diffusion barrier and contains silicon and chromium and optionally titanium or aluminum. The method comprises depositing a surface alloy on the base alloy at a temperature in the range of 400 to 1000 °C and heat treating the surface alloy at a ramp temperature rate of at least 5 °C/minute, preferably 10 to 20 °C/minute, to a desired maximum temperature at which the surface alloyed component is maintained for a time sufficient to provide the enrichment pool or the enrichment pool with a diffusion barrier layer. A reactive gas treatment may be used to generate a replenishable protective oxide scale of alumina or chromia on the outermost surface of the surface alloyed component.

公开(公告)号：WO1997041275A1

公开(公告)日：1997-11-06

申请号：PCT/CA1997000261

申请日：1997-04-21

Applicant: WESTAIM TECHNOLOGIES INC. ,  PETRONE, Sabino, Steven, Anthony ,  MANDYAM, Radhakrishna, Chakravarthy ,  WYSIEKIERSKI, Andrew, George

Inventor： WESTAIM TECHNOLOGIES INC.

IPC: C23C12/02

CPC classification number: C23C26/00 ,  C23C10/52 ,  C23C12/02 ,  Y10T428/12458 ,  Y10T428/1259 ,  Y10T428/12618 ,  Y10T428/12854 ,  Y10T428/12931 ,  Y10T428/12958 ,  Y10T428/12979

Abstract: There is provided a surface alloyed component which comprises a base alloy with a diffusion barrier layer enriched in silicon and chromium being provided adjacent thereto. An enrichment pool layer is created adjacent said diffusion barrier and contains silicon and chromium and optionally titanium or aluminum. A reactive gas treatment may be used to generate a replenishable protective scale on the outermost surface of said component.

Abstract translation: 提供了一种表面合金成分，其包括具有富含硅的扩散阻挡层的基底合金和与之相邻的铬。 在所述扩散阻挡层附近产生富集池层，并且含有硅和铬以及任选的钛或铝。 可以使用反应性气体处理来在所述组件的最外表面上产生可补充的保护垢。