公开(公告)号：WO2011042792A3

公开(公告)日：2011-04-14

申请号：PCT/IB2010/002515

申请日：2010-10-05

Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA ,  KURITA WATER INDUSTRIES LTD. ,  YANAGIMOTO, Hiroshi ,  BESSHO, Takeshi ,  MORITA, Hiroshi ,  NEMOTO, Atsushi

Inventor： YANAGIMOTO, Hiroshi ,  BESSHO, Takeshi ,  MORITA, Hiroshi ,  NEMOTO, Atsushi

IPC: C23C18/20 ,  C23C18/22

Abstract: A method for performing an ozone gas treatment on a surface of a resin substrate that includes: setting conditions of ozone gas concentration D, treatment time t, and ozone gas temperature T using an ozone gas exposure amount I that is obtained by the following equation: I=Dxtxexρ((-L/(273.15+T)) (where D is the ozone gas concentration, t is the treatment time, T is the ozone gas temperature, and L is the temperature coefficient); exposing the surface of the resin substrate to the ozone gas according to the conditions that are set; and treating the surface of the resin substrate with an alkaline solution after the substrate surface has been exposed to the ozone gas.

公开(公告)号：WO2011042792A2

公开(公告)日：2011-04-14

申请号：PCT/IB2010002515

申请日：2010-10-05

Applicant: TOYOTA MOTOR CO LTD ,  KURITA WATER IND LTD ,  YANAGIMOTO HIROSHI ,  BESSHO TAKESHI ,  MORITA HIROSHI ,  NEMOTO ATSUSHI

Inventor： YANAGIMOTO HIROSHI ,  BESSHO TAKESHI ,  MORITA HIROSHI ,  NEMOTO ATSUSHI

CPC classification number: C23C18/30 ,  C23C18/2033 ,  C23C18/2086 ,  C23C18/22 ,  C23C18/285

Abstract: A method for performing an ozone gas treatment on a surface of a resin substrate that includes: setting conditions of ozone gas concentration D, treatment time t, and ozone gas temperature T using an ozone gas exposure amount I that is obtained by the following equation: I=Dxtxex?((-L/(273.15+T)) (where D is the ozone gas concentration, t is the treatment time, T is the ozone gas temperature, and L is the temperature coefficient); exposing the surface of the resin substrate to the ozone gas according to the conditions that are set; and treating the surface of the resin substrate with an alkaline solution after the substrate surface has been exposed to the ozone gas.

Abstract translation: 一种臭氧气体处理方法，其特征在于，使用通过下式求出的臭氧气体露出量I来设定臭氧气体浓度D，处理时间t，臭氧气体温度T的条件： I = Dxtxex？（（ - L /（273.15 + T））（其中D是臭氧气体浓度，t是处理时间，T是臭氧气体温度，L是温度系数）;暴露 根据设定的条件将所述树脂基板粘合到所述臭氧气体上;以及在所述基板表面已经暴露于所述臭氧气体之后用碱性溶液处理所述树脂基板的表面。