公开(公告)号：WO2005062130A3

公开(公告)日：2006-04-20

申请号：PCT/US2004041112

申请日：2004-12-06

申请人： NIPPON KOGAKU KK ,  PHILLIPS ALTON HUGH

发明人： PHILLIPS ALTON HUGH

IPC分类号： G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70991

摘要： Techniques for transferring utilities to and from a reticle or wafer stage (200) in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage (200) without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use/or control the transferred utilities.

摘要翻译： 描述了在将光刻系统中的掩模版或晶片台（200）转移到物理干扰的同时最小化影响台阶的技术。 这些技术涉及将工具转移到舞台（200）和从舞台（200）转移，而不与舞台进行实际接触。 或者，当舞台处于静止位置时，通过与舞台物理接触来转移效用。 除了将工具转移到舞台之外，诸如处理设备，缓冲器（存储介质），电气组件和机械组件之类的设备可以放置在舞台内以使用/或控制所传送的实用程序。

公开(公告)号：WO2006044221A3

公开(公告)日：2006-04-27

申请号：PCT/US2005/035972

申请日：2005-10-07

申请人： NIKON CORPORATION ,  PHILLIPS, Alton, Hugh

发明人： PHILLIPS, Alton, Hugh

IPC分类号： G03B27/58

摘要： An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage supports a reticle and is capable of moving the reticle in x-y-z directions. The optical stage includes a plurality of components to direct light reflected from the reticle onto a wafer substrate and a safety mechanism to move one or more components of the optical stage away from the reticle stage.

公开(公告)号：WO2006044221A2

公开(公告)日：2006-04-27

申请号：PCT/US2005035972

申请日：2005-10-07

申请人： NIKON RES CORP OF AMERICA ,  PHILLIPS ALTON HUGH

发明人： PHILLIPS ALTON HUGH

IPC分类号： G03B27/58

CPC分类号： G03F7/70983 ,  G03B27/58 ,  G03F7/707

摘要： An apparatus and method are disclosed having a stage reticle safety feature. The apparatus includes a reticle stage and an optical stage. The reticle stage supports a reticle and is capable of moving the reticle in x-y-z directions. The optical stage includes a plurality of components to direct light reflected from the reticle onto a wafer substrate and a safety mechanism to move one or more components of the optical stage away from the reticle stage.

摘要翻译： 公开了一种具有舞台光罩安全特征的装置和方法。 该装置包括光罩台和光学平台。 标线片台支持掩模版，并且能够在x-y-z方向上移动掩模版。 光学平台包括将从掩模版反射的光引导到晶片基板上的多个部件，以及将光学平台的一个或多个部件远离光罩台的安全机构。

公开(公告)号：WO2022192368A1

公开(公告)日：2022-09-15

申请号：PCT/US2022/019511

申请日：2022-03-09

申请人： NIKON CORPORATION ,  PHILLIPS, Alton Hugh

发明人： GOODWIN, Eric Peter ,  GOLDSTEIN, Goldie Lynne ,  RENWICK, Stephen Paul ,  BINNARD, Michael Birk ,  CHANG, Patrick Shih ,  ROSA, Matthew David ,  WELLS, Jonathan Kyle

IPC分类号： B29C64/153 ,  B29C64/245 ,  B29C64/241 ,  B22F10/28 ,  B22F12/37 ,  B22F12/90 ,  B22F10/31 ,  B22F12/00 ,  B33Y10/00 ,  B33Y30/00

摘要： The problem of correcting positioning errors in 3D printing processes is addressed by systems and methods that utilize sensing modules to determine a position or an orientation of a substrate (110) or a 3D printing build platform (120). A first sensing module (150) may determine a position or orientation of the substrate. The first sensing module may utilize a variety of light sources, reflective elements, optical detectors, and controllers to determine the position or orientation of the substrate. A second sensing module (160) may determine a position or orientation of the 3D printing build platform relative to the position or orientation of the substrate. The second sensing module may employ one or more fiducial markers to determine information indicative of the position or orientation of the 3D printing build platform. The position or orientation information determined by the first or second sensing modules may be used to correct errors in the 3D printing process.

公开(公告)号：WO2021003202A2

公开(公告)日：2021-01-07

申请号：PCT/US2020/040391

申请日：2020-07-01

申请人： NIKON CORPORATION ,  PHILLIPS, Alton Hugh

发明人： CHANG, Patrick Shih ,  BINNARD, Michael Birk ,  ROSA, Matthew ,  KETSAMANIAN, Serhad ,  GUO, Lexian ,  HERR, Brett William ,  GOODWIN, Eric Peter ,  MARQUEZ, Johnathan Agustin ,  BJORK, Matthew Parker-McCormick ,  COON, Paul Derek ,  ISHIKAWA, Motofusa

IPC分类号： B22F3/105 ,  B29C64/241 ,  B29C64/245 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  B29C64/268 ,  B29C64/371 ,  B22F12/37 ,  B22F10/28 ,  B22F12/00 ,  B22F10/31 ,  B22F12/226 ,  B22F12/38 ,  B22F12/41 ,  B22F12/45 ,  B22F12/90 ,  B22F2999/00 ,  B29C64/153

摘要： To improve the operation of 3D printing systems, techniques are disclosed for a rotary 3D printer comprising: a main rotating support table rotating about a first axis and one or more secondary support tables rotating around a non-coaxial secondary axis; a powder supply assembly for distributing powder onto the tables; and an energy system for directing an energy beam at the powder to form a part. The main support table and secondary support tables can rotate in the same or opposite directions. Disclosed techniques include: grooved support table surfaces for improving stability of applied powder; reciprocating bellows for controlling a differential load on actuators that move the support tables; high temperature bearings or bushings for supporting rotary motion at high temperatures; and a mechanism for counterbalancing a weight of the part being built.

公开(公告)号：WO2005062130A2

公开(公告)日：2005-07-07

申请号：PCT/US2004/041112

申请日：2004-12-06

申请人： NIKON CORPORATION ,  PHILLIPS, Alton, Hugh

发明人： PHILLIPS, Alton, Hugh

IPC分类号： G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70991

摘要： Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques involve transferring utilities to and from the stage without making physical contact with the stage. Alternatively, utilities are transferred by making physical contact with the stage while the stage is in a stationary position. In addition to transferring utilities to and from the stage, devices such as processing devices, buffers (storage mediums), electrical components, and mechanical components can be placed within the stage to use/or control the transferred utilities.

摘要翻译： 描述了在将光刻系统中的掩模版或晶片台传递到工作台的技术，同时最小化影响台阶的物理扰动的技术。 这些技术涉及在不与舞台进行身体接触的情况下将工具转移到舞台上和从舞台转移。 或者，当舞台处于静止位置时，通过与舞台物理接触来转移效用。 除了将工具转移到舞台之外，诸如处理设备，缓冲器（存储介质），电气组件和机械组件的设备可以被放置在舞台内以使用/或控制传送的实用程序。