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公开(公告)号:WO2012082686A1
公开(公告)日:2012-06-21
申请号:PCT/US2011/064544
申请日:2011-12-13
Applicant: DOW CORNING CORPORATION , BERGER, Stephanie , KATSOULIS, Dimitris , LARSEN, Robert, Thomas , MCLAUGHLIN, Matthew, J. , PILLAI, Unnikrishnan, R. , WINELAND, Jonathan, David
Inventor: BERGER, Stephanie , KATSOULIS, Dimitris , LARSEN, Robert, Thomas , MCLAUGHLIN, Matthew, J. , PILLAI, Unnikrishnan, R. , WINELAND, Jonathan, David
IPC: C07F7/02 , C01B33/107
CPC classification number: C01B33/1071 , C01B33/107
Abstract: A method of making a trihalosilane comprising contacting an organotrihalosilane according to the formula RS1X3 (I), wherein R is C 1 -C 10 hydrocarbyl and each X independently is halo, with hydrogen, wherein the mole ratio of the organotrihalosilane to hydrogen is from 0.009:1 to 1:2300, in the presence of a catalyst comprising a metal selected from (i) Re, (ii) a mixture comprising Re and at least one element selected from Pd, Ru, Mn, Cu, and Rh, (iii) a mixture comprising Ir and at least one element selected from Pd and Rh, (iv) Mn, (v) a mixture comprising Mn and Rh, (vi) Ag, (vii) Mg, and (viii) Rh at from 300 to 800 °C to form a trihalosilane.
Abstract translation: 一种制备三卤代硅烷的方法,其包括使式RS1X3(Ⅰ)的有机三卤硅烷与其中R为C1-C10烃基并且每个X独立地为卤素与有机三卤代硅烷与氢的摩尔比为0.009:1 在包含选自(i)Re,(ii)包含Re和至少一种选自Pd,Ru,Mn,Cu和Rh的元素的混合物的催化剂存在下,(iii)a 包含Ir和选自Pd和Rh中的至少一种元素的混合物,(iv)Mn,(v)包含Mn和Rh的混合物,(vi)Ag,(vii)Mg和(viii)Rh在300至800℃ 以形成三卤硅烷。
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公开(公告)号:WO2011046663A1
公开(公告)日:2011-04-21
申请号:PCT/US2010/043492
申请日:2010-07-28
Applicant: DOW CORNING CORPORATION , KOHANE, Joseph, Pete , PILLAI, Unnikrishnan, R. , WINELAND, Jonathan, David
IPC: C07F7/16
CPC classification number: C07F7/16
Abstract: The invention pertains to a process for the preparation of organohalosilanes. The process comprises contacting a first finely-divided silicon comprising from 0.08 to 0.25 % (w/w) of aluminum with an organohalide in a reactor at a temperature of from 250 to 350 °C in the presence of a Direct Process catalyst comprising copper, and a promotor; and introducing a second finely-divided silicon into the reactor comprising from 0.001 to
Abstract translation: 本发明涉及一种制备有机卤代硅烷的方法。 该方法包括在250-350℃的温度下,在包含铜的直接方法催化剂的存在下,使反应器中含有0.08-0.25%(w / w)的铝的有机卤化物的第一细分硅与有机卤化物接触, 和启动子; 并且将需要的量足以保持铝浓度为0.08-0.2%(w / w)的量,将含有0.001至0.10%(w / w)铝的第二细碎硅引入反应器中, ,基于未反应的硅和铝的重量。
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公开(公告)号:WO2010075013A3
公开(公告)日:2010-11-18
申请号:PCT/US2009067803
申请日:2009-12-14
Applicant: DOW CORNING , KOHANE JOSEPH PETER , PILLAI UNNIKRISHNAN R , WINELAND JONATHAN DAVID
Inventor: KOHANE JOSEPH PETER , PILLAI UNNIKRISHNAN R , WINELAND JONATHAN DAVID
IPC: C07F7/16
CPC classification number: C07F7/16
Abstract: The invention pertains to a method of producing organohalohydrosilanes by treating a silicon metal with a halogen-containing compound, wherein the halogen-containing compound has a formula selected from RdSiX4-d (II) and RX (III), combining a catalyst and a promoter with the treated silicon metal, and contacting the combination with hydrogen gas and an organohalide. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a combination of silicon metal, a catalyst, a promoter and a hydrogen- storage material. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a combination of a silicon metal, a catalyst, a promoter and a hydrogenation catalyst. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a reaction mass residue and optionally a hydrogenation catalyst.
Abstract translation: 本发明涉及通过用含卤素化合物处理硅金属来制备有机卤代氢硅烷的方法,其中含卤素化合物具有选自RdSiX4-d(Ⅱ)和RX(Ⅲ)的式子,将催化剂和助催化剂 与经处理的硅金属接触,并与氢气和有机卤化物接触。 本发明还涉及通过使有机卤化物和氢气与硅金属,催化剂,助催化剂和储氢材料的组合接触来生产有机卤代氢硅烷的方法。 本发明还涉及通过使有机卤化物和氢气与硅金属,催化剂,助催化剂和氢化催化剂的组合接触来制造有机卤代氢硅烷的方法。 本发明还涉及通过使有机卤化物和氢气与反应物质残余物和任选的氢化催化剂接触来制备有机卤代氢硅烷的方法。
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公开(公告)号:WO2010075013A2
公开(公告)日:2010-07-01
申请号:PCT/US2009/067803
申请日:2009-12-14
Applicant: DOW CORNING CORPORATION , KOHANE, Joseph, Peter , PILLAI, Unnikrishnan, R. , WINELAND, Jonathan, David
IPC: C07F7/16
CPC classification number: C07F7/16
Abstract: The invention pertains to a method of producing organohalohydrosilanes by treating a silicon metal with a halogen-containing compound, wherein the halogen-containing compound has a formula selected from R d SiX 4-d (II) and RX (III), combining a catalyst and a promoter with the treated silicon metal, and contacting the combination with hydrogen gas and an organohalide. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a combination of silicon metal, a catalyst, a promoter and a hydrogen- storage material. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a combination of a silicon metal, a catalyst, a promoter and a hydrogenation catalyst. The invention also pertains to a method of producing organohalohydrosilanes by contacting an organohalide and hydrogen gas with a reaction mass residue and optionally a hydrogenation catalyst.
Abstract translation: 本发明涉及通过用含卤素化合物处理硅金属来制备有机卤代氢硅烷的方法,其中含卤素化合物具有选自RdSiX4-d(Ⅱ)和RX(Ⅲ)的式子,将催化剂和助催化剂 与经处理的硅金属接触,并与氢气和有机卤化物接触。 本发明还涉及通过使有机卤化物和氢气与硅金属,催化剂,助催化剂和储氢材料的组合接触来生产有机卤代氢硅烷的方法。 本发明还涉及通过使有机卤化物和氢气与硅金属,催化剂,助催化剂和氢化催化剂的组合接触来制造有机卤代氢硅烷的方法。 本发明还涉及通过使有机卤化物和氢气与反应物质残余物和任选的氢化催化剂接触来制备有机卤代氢硅烷的方法。
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