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公开(公告)号:WO2011054510A2
公开(公告)日:2011-05-12
申请号:PCT/EP2010006716
申请日:2010-11-04
Applicant: SOLAR SEMI ENGINEERING LTD , TRONRUD ENGINEERING AS , RAMSLAND ARNE , HJERTAAS ERIK , BESANT JOHN DOUGLAS , WINDSOR MARK LAURENCE
Inventor: RAMSLAND ARNE , HJERTAAS ERIK , BESANT JOHN DOUGLAS , WINDSOR MARK LAURENCE
CPC classification number: H01L21/67057 , H01L21/67313
Abstract: The present invention relates to a method of handling a plurality of wafers (1). The method comprises the steps of: providing a plurality of wafers (1), each wafer being bonded to a substrate (3a) along a first edge. The wafers (1) are supported at their edges in a support frame (5) so as to maintain a space between adjacent wafers (1). The wafers (1) are separated from the substrate (3a) while they are supported in the support frame (5). A spreader plate (10) can be provided for controlling the loading applied to an end wafer. The invention also relates to a support frame (5) for supporting a plurality of wafers (1).
Abstract translation: 处理多个晶片(1)的方法技术领域本发明涉及一种处理多个晶片(1)的方法。 该方法包括以下步骤:提供多个晶片(1),每个晶片沿着第一边缘结合到衬底(3a)。 晶片(1)在其边缘处被支撑在支撑框架(5)中,以保持相邻晶片(1)之间的空间。 晶片(1)在被支撑在支撑框架(5)中的同时与基板(3a)分离。 可以提供散热板(10)以控制施加到端部晶片的负载。 本发明还涉及用于支撑多个晶片(1)的支撑框架(5)。
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公开(公告)号:WO2013030771A1
公开(公告)日:2013-03-07
申请号:PCT/IB2012/054426
申请日:2012-08-29
Applicant: NORSK WAX AS , TRONRUD ENGINEERING AS , RAMSLAND, Arne , PETTERSEN, Jarl, Martin
Inventor: RAMSLAND, Arne , PETTERSEN, Jarl, Martin
CPC classification number: A01G7/06 , A01G13/105
Abstract: A waxing machine and a method are described for applying wax to plants with a trunk, which waxing machine comprises a conveyer belt (12) for transport of the plants and at least one wax vat (14). The at least one wax vat is filled with liquid wax when the waxing machine is in use, and is arranged for travel in a path (S). The at least one wax vat, over a waxing distance (E), is arranged near the conveyer belt. Furthermore, the conveyer belt's movement and the at least one wax vat's movement are synchronised so that the trunk (20) of a plant on the conveyer belt is passed over or lowered into the at least one wax vat and coated with wax as the plant on the conveyer belt and the at least one wax vat travel over the waxing distance.
Abstract translation: 描述了一种打蜡机和一种用于将蜡施加到具有树干的植物上的方法,该打蜡机包括用于运输植物的输送带(12)和至少一个蜡桶(14)。 当打蜡机在使用时,至少一个蜡桶充满液体蜡,并且布置成在路径(S)中行进。 在打蜡距离(E)上的至少一个蜡桶布置在输送带附近。 此外,传送带的运动和至少一个蜡缸的运动是同步的,使得输送带上的植物的树干(20)通过或者降低到至少一个蜡桶中并且涂覆有作为植物的蜡 输送带和至少一个蜡缸在打蜡距离上行进。
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公开(公告)号:WO2011054510A3
公开(公告)日:2011-05-12
申请号:PCT/EP2010/006716
申请日:2010-11-04
Applicant: SOLAR SEMI ENGINEERING LIMITED , TRONRUD ENGINEERING AS , RAMSLAND, Arne , HJERTAAS, Erik , BESANT, John, Douglas , WINDSOR, Mark, Laurence
Inventor: RAMSLAND, Arne , HJERTAAS, Erik , BESANT, John, Douglas , WINDSOR, Mark, Laurence
IPC: H01L21/673 , H01L21/67 , B28D5/00
Abstract: The present invention relates to a method of handling a plurality of wafers (1). The method comprises the steps of: providing a plurality of wafers (1), each wafer being bonded to a substrate (3a) along a first edge. The wafers (1) are supported at their edges in a support frame (5) so as to maintain a space between adjacent wafers (1). The wafers (1) are separated from the substrate (3a) while they are supported in the support frame (5). A spreader plate (10) can be provided for controlling the loading applied to an end wafer. The invention also relates to a support frame (5) for supporting a plurality of wafers (1).
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公开(公告)号:WO2009091264A3
公开(公告)日:2009-10-01
申请号:PCT/NO2009000019
申请日:2009-01-15
Applicant: REC SCANWAFER AS , WANG PER ARNE , RAMSLAND ARNE , TRONRUD OLE CHRISTIAN , HJERTAAS ERIK , HAMMEL BENT , SKEIE ANDRE , TRONRUD OLA
Inventor: WANG PER ARNE , RAMSLAND ARNE , TRONRUD OLE CHRISTIAN , HJERTAAS ERIK , HAMMEL BENT , SKEIE ANDRE , TRONRUD OLA
CPC classification number: H01L21/67051 , B28D5/0076 , H01L21/02052 , H01L21/67057 , H01L31/04
Abstract: The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the wafer stack and the nozzle in the stacking direction.
Abstract translation: 本发明包括用于对沿着堆叠方向布置在堆叠中的单个晶片或衬底进行表面清洁的装置和方法,其中沿垂直于堆叠方向的方向将流体射流发送到堆叠,并且提供 晶片堆叠和喷嘴在堆叠方向上。
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公开(公告)号:WO2009091264A2
公开(公告)日:2009-07-23
申请号:PCT/NO2009/000019
申请日:2009-01-15
Applicant: REC SCANWAFER AS , WANG, Per, Arne , RAMSLAND, Arne , TRONRUD, Ole, Christian , HJERTAAS, Erik , HAMMEL, Bent , SKEIE, André , TRONRUD, Ola
Inventor: WANG, Per, Arne , RAMSLAND, Arne , TRONRUD, Ole, Christian , HJERTAAS, Erik , HAMMEL, Bent , SKEIE, André , TRONRUD, Ola
IPC: H01L31/18
CPC classification number: H01L21/67051 , B28D5/0076 , H01L21/02052 , H01L21/67057 , H01L31/04
Abstract: The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the wafer stack and the nozzle in the stacking direction.
Abstract translation: 本发明包括用于沿着层叠方向在堆叠中布置的单个晶片或基板的表面清洁的装置和方法,其中在垂直于层叠方向的方向上向堆叠发送流体射流,并且提供了在 晶片堆叠和喷嘴沿堆叠方向。
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公开(公告)号:WO2008075970A1
公开(公告)日:2008-06-26
申请号:PCT/NO2007/000453
申请日:2007-12-19
Applicant: REC SCANWAFER AS , WANG, Per, Arne , RAMSLAND, Arne , TRONRUD, Ole, Christian , HJERTAAS, Erik , HAMMEL, Bent , SKEIE, André , TRONRUD, Ola
Inventor: WANG, Per, Arne , RAMSLAND, Arne , TRONRUD, Ole, Christian , HJERTAAS, Erik , HAMMEL, Bent , SKEIE, André , TRONRUD, Ola
IPC: H01L21/677 , H01L21/683 , B65G49/06 , B28D5/00
CPC classification number: B28D5/0082 , B65G49/061 , B65G49/068 , B65G2249/04 , Y10T156/19
Abstract: The invention relates to a method for separation of a silicon wafer (12a) from a vertical stack (10) of silicon wafers (12). The method is characterised in that it comprises attaching a movable transport device (2) to a surface of the silicon wafer (12a) in the stack (10), and horizontal movement of the silicon wafer (12a) parallel (A) to the surface of the silicon wafer (12a) until the silicon wafer (12a) is separated from the stack (10). The invention also comprises a device for implementing the method.
Abstract translation: 本发明涉及一种用于从硅晶片(12)的垂直叠层(10)分离硅晶片(12a)的方法。 该方法的特征在于,其包括将可移动传送装置(2)附接到堆叠(10)中的硅晶片(12a)的表面,并且将硅晶片(12a)平行(A)水平移动到表面 的硅晶片(12a)直到硅晶片(12a)与堆叠(10)分离。 本发明还包括用于实现该方法的装置。
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