WATER-SOLUBLE ANIONIC POLYMER DISPERSION AND METHOD FOR PRODUCING THE SAME
    1.
    发明申请
    WATER-SOLUBLE ANIONIC POLYMER DISPERSION AND METHOD FOR PRODUCING THE SAME 审中-公开
    水溶性阴离子聚合物分散体及其制造方法

    公开(公告)号:WO2007069857A1

    公开(公告)日:2007-06-21

    申请号:PCT/KR2006/005449

    申请日:2006-12-14

    CPC classification number: C08F2/20 C08F2/16

    Abstract: The present invention refers to water-soluble anionic polymer dispersion and its manu¬ facturing process. To be more specific, it is about the producing method of water-soluble anionic polymer dispersion which is characterized by containing radical copolymer. The radical copolymer was created from salt solvent that contains anionic monomer, non-ionic monomer, ionic dispersant, radical polymerization initiator and, anionic surfactant and/ or non-ionic surfactant.

    Abstract translation: 本发明涉及水溶性阴离子聚合物分散体及其制造方法。 更具体地说,它是以含有自由基共聚物为特征的水溶性阴离子聚合物分散体的制造方法。 自由基共聚物由含有阴离子单体,非离子单体,离子分散剂,自由基聚合引发剂和阴离子表面活性剂和/或非离子表面活性剂的盐溶剂产生。

    SILICA BASE FOR DENTRIFRICE AND PROCESS FOR ITS PREPARATION
    2.
    发明申请
    SILICA BASE FOR DENTRIFRICE AND PROCESS FOR ITS PREPARATION 审中-公开
    二氧化硅基础用于制剂的制备和方法

    公开(公告)号:WO1984003439A1

    公开(公告)日:1984-09-13

    申请号:PCT/JP1984000071

    申请日:1984-02-28

    Abstract: Silica base for dentifrice having excellent transparency and prolonged stability, desired abrasive ability, specific surface area of 5 to 60 m2/g as measured according to the BET or CTAB method, with the difference therebetween being 40 m2/g or less, and having a refractive index of 1.42 to 1.45, which can be prepared by reacting an alkali metal silicate solution with hydrochloric or sulfuric acid in the presence of an electrolyte, controlling the ratio of the rate of adding chloride or sulfate ion in a silicaprecipitating step in which the pH of the reaction system is up to 10.0 to that in a neutralizing step of rendering the pH of the reaction system to 8.0 to 6.5 to at least 5 : 3, completing the neutralizing step within 30 minutes, and ripening for at least ten minutes.

    SILICA BASE FOR DENTIFRICE AND PROCESS FOR ITS PREPARATION
    4.
    发明申请
    SILICA BASE FOR DENTIFRICE AND PROCESS FOR ITS PREPARATION 审中-公开
    二氧化硅基础及其制备方法

    公开(公告)号:WO1984003438A1

    公开(公告)日:1984-09-13

    申请号:PCT/JP1984000070

    申请日:1984-02-28

    Abstract: Silica base for dentifrice having excellent transparency and prolonged stability, desired abrasive ability, specific surface area of 270 to 500 m2/g (according to the BET method) or 5 to 60 m2/g (according to the CTAB method), and a refractive index of 1.455 to 1.470 and showing, after baking at 1100 C, a substantially amorphous X ray diffraction pattern, which can be prepared by reacting an alkali metal silicate solution with hydrochloric or sulfuric acid in the presence of an electrolyte, controlling the ratio of the rate of adding chloride or sulfate ion in a silica-precipitating step in which the pH of the reaction system is up to 10.0 to that in an acidifying step in which the pH is adjusted to 3.5 or less at the completion of the reaction to at least 3 : 2, and completing the acidifying step within 30 minutes.

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