公开(公告)号：WO2007110322A1

公开(公告)日：2007-10-04

申请号：PCT/EP2007/052374

申请日：2007-03-14

Applicant: NV BEKAERT SA ,  DEKEMPENEER, Erik ,  DE BOSSCHER, Wilmert ,  VERHEYEN, Pascal

Inventor： DEKEMPENEER, Erik ,  DE BOSSCHER, Wilmert ,  VERHEYEN, Pascal

IPC: C23C14/34 ,  C23C14/56

CPC classification number: H01J37/3405 ,  C23C14/34 ,  C23C14/56 ,  H01J37/3447

Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.

Abstract translation: 揭示了一种涂覆设备，其被设计成通过物理真空沉积工艺或化学真空沉积工艺或其组合来涂覆基底。 所述涂覆装置的特征在于它使用可旋转的磁控管（14），该磁控管可利用轴向可移动的挡板（18）覆盖。 这种布置使得能够在磁控管目标之间或在随后的涂覆步骤之间或之后保持目标清洁或清洁目标。 闸门还提供了目标附近的可控气体气氛。 描述了磁控管中心放置的布置。 然后通过将衬底悬挂在围绕磁控管的行星转盘（24）上将衬底从各个角度暴露于溅射源。

公开(公告)号：WO2007110323A1

公开(公告)日：2007-10-04

申请号：PCT/EP2007/052375

申请日：2007-03-14

Applicant: NV BEKAERT SA ,  DEKEMPENEER, Erik ,  DE BOSSCHER, Wilmert ,  VERHEYEN, Pascal

Inventor： DEKEMPENEER, Erik ,  DE BOSSCHER, Wilmert ,  VERHEYEN, Pascal

IPC: H01J37/34 ,  C23C14/35

CPC classification number: C23C14/354 ,  H01J37/32779 ,  H01J37/3405 ,  H01J37/3455

Abstract: A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapour deposition, by means of chemical vapour deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.

Abstract translation: 提出了一种用于批量涂布基材的涂布设备（100）。 在叠层的分批涂布机层中，可以通过物理气相沉积，通过化学气相沉积或两种方法的混合物沉积。 与以前的装置相比，混合模式工艺特别稳定。 这通过使用可旋转磁控管（112）而不是现有技术的平面磁控管来实现。 该装置还配备有允许并行或交替的处理步骤的可旋转快门。

公开(公告)号：WO1995003510A1

公开(公告)日：1995-02-02

申请号：PCT/BE1994000044

申请日：1994-07-12

Applicant: INNOVATIVE SPUTTERING TECHNOLOGY N.V. (I.S.T.) ,  LIEVENS, Hugo ,  VERHEYEN, Pascal

Inventor： INNOVATIVE SPUTTERING TECHNOLOGY N.V. (I.S.T.)

IPC: F21V07/22

CPC classification number: B32B7/02 ,  B32B15/08 ,  B32B27/308 ,  B32B27/36 ,  B32B38/0008 ,  B32B2307/416 ,  B32B2307/584 ,  B32B2310/14 ,  F21V7/22 ,  Y10S428/913 ,  Y10T428/24802 ,  Y10T428/2804 ,  Y10T428/2839 ,  Y10T428/31504 ,  Y10T428/31692 ,  Y10T428/31797 ,  Y10T428/31855

Abstract: The invention relates to a layered reflector (1) for light radiation comprising: a) a scratch resistant outer layer (2) transmitting this radiation, b) a first resin layer (3) bonded to it, which is provided with slip properties at least at its contact side (7) with the outer layer (2) and which layer c) is covered at its opposite side with a layer (4) reflecting said radiation and which by interposition of a bonding layer (6), d) is laminated to a second resin layer (5) which has slip properties at least at its free outer surface (8) opposite to the contact side with the bonding layer. The invention relates also to a process and intermediate products for manufacturing the reflector as well as a self-adhesive reflector (15) derived therefrom and a light reflecting structure (16).

Abstract translation: 本发明涉及一种用于光辐射的分层反射器（1），包括：a）传送该辐射的耐划伤外层（2），b）结合到其上的第一树脂层（3），至少具有滑动性 在其与外层（2）的接触侧（7）处，并且c）在其相反侧被反射所述辐射的层（4）覆盖，并且通过插入粘合层（6），d）层压 至少在其与接合层的接触侧相对的其自由外表面（8）处具有滑动性的第二树脂层（5）。 本发明还涉及用于制造反射器的工艺和中间产品以及从其衍生的自粘反射器（15）和光反射结构（16）。