公开(公告)号：WO2009143879A1

公开(公告)日：2009-12-03

申请号：PCT/EP2008/010141

申请日：2008-11-29

Applicant: CARL ZEISS SMT AG ,  PAZIDIS, Alexandra ,  SIX, Stephan ,  DÜSING, Rüdiger ,  FEDOSENKO, Gennady ,  VON PAPEN, Tilmann ,  ZACZEK, Christoph ,  HENSCHEL, Wolfgang

Inventor： PAZIDIS, Alexandra ,  SIX, Stephan ,  DÜSING, Rüdiger ,  FEDOSENKO, Gennady ,  VON PAPEN, Tilmann ,  ZACZEK, Christoph ,  HENSCHEL, Wolfgang

IPC: G03F7/20 ,  G02B1/10

CPC classification number: G03F7/70958 ,  G02B3/06 ,  G02B13/143 ,  G02B17/0892 ,  G03F7/70341

Abstract: The present invention relates to an optical element (1) having an optically free diameter, the optical element comprising: a material that is transparent to wavelengths in the ultraviolet region, at least one of an oleophobic coating (6, 7) outside of the optically free diameter and an oleophilic coating (9b, 9c) which is transparent to wavelengths in the UV region inside the optically free diameter, wherein at least one of the oleophobic coating (6, 7) and the oleophilic coating (9b, 9c) is at least one of microstructured and arranged on a microstructured surface (2, 4, 5) of the optical element (1). The present invention also relates to an element having at least one contact area that can be brought into contact with an immersion fluid, the contact area comprising a microstructure or nanostructure produced by material removal and/or comprising a coating stabilised with respect to UV irradiation.

Abstract translation: 本发明涉及具有光学自由直径的光学元件（1），该光学元件包括：对紫外线区域的波长透明的材料，光学上外部的疏油涂层（6,7）中的至少一个 自由直径和对光学自由直径内的UV区域中的波长透明的亲油性涂层（9b，9c），其中疏油涂层（6,7）和亲油涂层（9b，9c）中的至少一个处于 至少一个微结构并布置在光学元件（1）的微结构化表面（2,4,5）上。 本发明还涉及具有至少一个能够与浸没流体接触的接触区域的元件，所述接触区域包括通过材料去除产生的微结构或纳米结构和/或包括相对于UV照射而稳定的涂层。

公开(公告)号：WO2008031576A8

公开(公告)日：2009-02-19

申请号：PCT/EP2007007932

申请日：2007-09-12

Applicant: ZEISS CARL SMT AG ,  SIX STEPHAN ,  LILL MICHAEL ,  DUESING RUEDIGER ,  GELLRICH BERNHARD ,  WIDMANN MICHAEL ,  SCHUBERT ANDREAS ,  VON PAPEN TILMANN ,  IHL THOMAS

Inventor： SIX STEPHAN ,  LILL MICHAEL ,  DUESING RUEDIGER ,  GELLRICH BERNHARD ,  WIDMANN MICHAEL ,  SCHUBERT ANDREAS ,  VON PAPEN TILMANN ,  IHL THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/706

Abstract: The invention relates to an optical arrangement for immersion lithography, comprising: at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) comprises at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract translation: 本发明涉及一种用于浸没式光刻的光学装置，包括：至少一个施加有疏水涂层（6,7）的部件（1），所述疏水涂层（6,7）在操作期间暴露于紫外线辐射 投影透镜，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括至少一个抗紫外线层（6），其吸收和/或反射波长小于260nm的紫外线辐射。

公开(公告)号：WO2008031576A1

公开(公告)日：2008-03-20

申请号：PCT/EP2007/007932

申请日：2007-09-12

Applicant: CARL ZEISS SMT AG ,  SIX, Stephan ,  LILL, Michael ,  DÜSING, Rüdiger ,  GELRICH, Bernhard ,  WIDMANN, Michael ,  SCHUBERT, Andreas ,  VON PAPEN, Tilmann ,  IHL, Thomas

Inventor： SIX, Stephan ,  LILL, Michael ,  DÜSING, Rüdiger ,  GELRICH, Bernhard ,  WIDMANN, Michael ,  SCHUBERT, Andreas ,  VON PAPEN, Tilmann ,  IHL, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/706

Abstract: The invention relates to an optical arrangement for immersion lithography, comprising: at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) comprises at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract translation: 本发明涉及一种用于浸没式光刻的光学装置，包括：至少一个施加有疏水涂层（6,7）的部件（1），所述疏水涂层（6,7）在操作期间暴露于紫外线辐射 投影透镜，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括至少一个抗紫外线层（6），其吸收和/或反射波长小于260nm的紫外线辐射。