公开(公告)号：WO2008031576A8

公开(公告)日：2009-02-19

申请号：PCT/EP2007007932

申请日：2007-09-12

Applicant: ZEISS CARL SMT AG ,  SIX STEPHAN ,  LILL MICHAEL ,  DUESING RUEDIGER ,  GELLRICH BERNHARD ,  WIDMANN MICHAEL ,  SCHUBERT ANDREAS ,  VON PAPEN TILMANN ,  IHL THOMAS

Inventor： SIX STEPHAN ,  LILL MICHAEL ,  DUESING RUEDIGER ,  GELLRICH BERNHARD ,  WIDMANN MICHAEL ,  SCHUBERT ANDREAS ,  VON PAPEN TILMANN ,  IHL THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/706

Abstract: The invention relates to an optical arrangement for immersion lithography, comprising: at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) comprises at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract translation: 本发明涉及一种用于浸没式光刻的光学装置，包括：至少一个施加有疏水涂层（6,7）的部件（1），所述疏水涂层（6,7）在操作期间暴露于紫外线辐射 投影透镜，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括至少一个抗紫外线层（6），其吸收和/或反射波长小于260nm的紫外线辐射。

公开(公告)号：WO2013174398A1

公开(公告)日：2013-11-28

申请号：PCT/EP2012/002159

申请日：2012-05-22

Applicant: CARL ZEISS SMT GMBH ,  BECKER, Moritz ,  EHM, Dirk Heinrich ,  SCHMIDT, Stefan-Wolfgang ,  BUTSCHER, Vera ,  IHL, Thomas

Inventor： BECKER, Moritz ,  EHM, Dirk Heinrich ,  SCHMIDT, Stefan-Wolfgang ,  BUTSCHER, Vera ,  IHL, Thomas

IPC: G03F7/20

CPC classification number: G03F7/707 ,  G03F1/38

Abstract: A reticle (18) for use in a microlithographic projection exposure apparatus, comprises a reticle body (42) containing a pattern (16) and reticle coupling means (36), by means of which the reticle body (42) can be detachably coupled with a reticle-chuck (30). The reticle coupling means (36) are adapted such that the coupling of the reticle (18) with the reticle-chuck (30) can be effected by magnetic forces. Further, a Reticle-chuck (30) is provided which comprises a support unit (60) and chuck coupling means (38), by means of which a reticle (18) can be detachably coupled with the support unit (60). The chuck coupling means (38) are adapted such that the coupling of the reticle (18) with the support unit (60) can be effected by magnetic forces. Furthermore, a reticle positioning system (28) is described, wherein such a reticle (18) and such a reticle-chuck (30) are coupled to form a chuck-unit (32). Finally, an optical system having an illumination device (12) for illuminating an optical reticle (18) containing a pattern (16) and a projection objective (14) for imaging the reticle pattern (16) is provided with such a reticle positioning system (28).

Abstract translation: 一种用于微光刻投影曝光设备的掩模版（18），包括一个包含图案（16）和标线片耦合装置（36）的标线本体（42），通过该掩模体（42）可以将标线本体（42）可拆卸地与 标线盘卡盘（30）。 标线片耦合装置（36）适于使得光罩（18）与光罩卡盘（30）的耦合可以通过磁力来实现。 此外，提供了一种标线卡盘（30），其包括支撑单元（60）和卡盘联接装置（38），通过该卡盘联接装置可以将分划板（18）可拆卸地联接到支撑单元（60）。 卡盘联接装置（38）适于使得光罩（18）与支撑单元（60）的联接可以通过磁力来实现。 此外，描述了一个掩模版定位系统（28），其中这种掩模版（18）和这种光罩卡盘（30）联接以形成卡盘单元（32）。 最后，具有用于照射包含图案（16）的光学掩模版（18）的照明装置（12）和用于使掩模图案（16）成像的投影物镜（14）的光学系统设置有这样的掩模版定位系统 28）。

公开(公告)号：WO2008031576A1

公开(公告)日：2008-03-20

申请号：PCT/EP2007/007932

申请日：2007-09-12

Applicant: CARL ZEISS SMT AG ,  SIX, Stephan ,  LILL, Michael ,  DÜSING, Rüdiger ,  GELRICH, Bernhard ,  WIDMANN, Michael ,  SCHUBERT, Andreas ,  VON PAPEN, Tilmann ,  IHL, Thomas

Inventor： SIX, Stephan ,  LILL, Michael ,  DÜSING, Rüdiger ,  GELRICH, Bernhard ,  WIDMANN, Michael ,  SCHUBERT, Andreas ,  VON PAPEN, Tilmann ,  IHL, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/706

Abstract: The invention relates to an optical arrangement for immersion lithography, comprising: at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) comprises at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Abstract translation: 本发明涉及一种用于浸没式光刻的光学装置，包括：至少一个施加有疏水涂层（6,7）的部件（1），所述疏水涂层（6,7）在操作期间暴露于紫外线辐射 投影透镜，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括至少一个抗紫外线层（6），其吸收和/或反射波长小于260nm的紫外线辐射。