公开(公告)号：WO2012170767A1

公开(公告)日：2012-12-13

申请号：PCT/US2012/041477

申请日：2012-06-08

Applicant: ILLINOIS TOOL WORKS INC. ,  WILLIS, Robert ,  WITHERS, Bradley, S.

Inventor： WILLIS, Robert ,  WITHERS, Bradley, S.

IPC: B08B1/04 ,  A46B13/00

CPC classification number: H01L21/67046 ,  A46B13/001 ,  B08B1/04

Abstract: A cleaning device for cleaning substrates is provided. The cleaning device includes a generally cylindrically-shaped brush mandrel and a cylindrical brush. The brush mandrel has a body section with an outer surface positioned about a central axis. The outer surface is interrupted by an engagement member having primary features adjacent secondary features. The brush has a hollow bore formed around the brush mandrel with an inner surface interrupted by a second engagement member which mates the first engagement member. The primary features flow in a direction generally perpendicular to a rotational direction of the brush mandrel around the central axis and include a first surface which is generally perpendicular to the outer surface. The secondary features include a second surface which flows in a direction generally perpendicular to the first surface and along the central axis. No primary feature includes a radially obstructing feature formed over any secondary feature.

Abstract translation: 提供了用于清洁基板的清洁装置。 清洁装置包括大致圆柱形的刷心轴和圆柱形刷。 刷心轴具有主体部分，其外表面围绕中心轴线定位。 外表面被具有相邻次要特征的主要特征的接合构件中断。 刷子具有形成在刷心轴周围的中空孔，其内表面被与第一接合构件配合的第二接合构件中断。 主要特征沿着大致垂直于中心轴线的刷心的旋转方向的方向流动并且包括大致垂直于外表面的第一表面。 次要特征包括沿着大致垂直于第一表面并沿着中心轴线的方向流动的第二表面。 没有主要特征包括在任何次要特征上形成的径向阻碍特征。