公开(公告)号：WO2008156908A1

公开(公告)日：2008-12-24

申请号：PCT/US2008/060712

申请日：2008-04-18

Applicant: E. I. DU PONT DE NEMOURS AND COMPANY ,  CATRON, John, Jr. ,  GAO, Feng ,  JOHNSON, Lynda, Kaye ,  METH, Jeffrey, Scott ,  ZANE, Stephen, G.

Inventor： CATRON, John, Jr. ,  GAO, Feng ,  JOHNSON, Lynda, Kaye ,  METH, Jeffrey, Scott ,  ZANE, Stephen, G.

IPC: H01L51/00

CPC classification number: H01L51/0021 ,  H01L31/1884 ,  H01L51/0013 ,  H01L51/0023 ,  H01L51/0096 ,  H05K3/046 ,  H05K2201/0108 ,  H05K2201/0329 ,  H05K2203/0528 ,  H05K2203/107 ,  Y02E10/549 ,  Y02P70/521

Abstract: Provided are processes for making a transparent conducting pattern. The invention is also directed to electronic devices containing such transparent conducting patterns. Further provided is a substrate comprising a base film and a transparent conducting layer disposed on the base film; wherein the substrate has an OD of about 0.1 to 0.6 at 830 nm, and the transparent conducting layer comprises polyethylene dioxythiophene and has an OD of less than 0.1 in the range of 400 to 700 nm.

Abstract translation: 提供了制造透明导电图案的工艺。 本发明还涉及包含这种透明导电图案的电子设备。 还提供了一种基材，其包括基膜和设置在基膜上的透明导电层; 其中所述基板在830nm处具有约0.1至0.6的OD，并且所述透明导电层包含聚乙烯二氧噻吩，并且在400至700nm的范围内具有小于0.1的OD。