Abstract:
The present invention is drawn to a layered structure suitable as a support for an organic light emitting device (OLED), said layered structure comprising: ∙ (i) A light-transmissive glass substrate, ∙ (ii) A diffusive internal extraction layer (IEL) with an outer layer made of a glass containing at least 30 weight% of Bi 2 O 3 , formed on one side of the light-transmissive glass substrate, ∙ (iii) An acid-resistant barrier layer formed on the IEL, said acid-resistant barrier layer having a bilayer structure made of an ∙ - ALD-deposited metal oxide layer (5), the metal oxide being selected from the group consisting of aluminum oxide (Al 2 O 3 ), titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ) and hafnium oxide (HfO 2 ), in contact with the IEL, and ∙ - a sputter-deposited SiO x N y layer (4) in contact with the ALD-deposited metal oxide layer. The present invention also is drawn to a method for producing such a layered structure suitable as OLED substrate.
Abstract translation:本发明涉及适合作为有机发光器件(OLED)的支撑体的分层结构,所述层状结构包括:∙(i)透光玻璃衬底∙(ii)扩散内部提取层(IEL) )与形成在透光性玻璃基板的一侧的含有至少30重量%的Bi 2 O 3的玻璃的外层组合,∙(iii)在IEL上形成的耐酸性阻隔层, 具有由∙-AlD沉积的金属氧化物层(5)制成的双层结构的金属氧化物,所述金属氧化物选自氧化铝(Al 2 O 3),氧化钛(TiO 2),氧化锆( ZrO 2)和与IEL接触的氧化铪(HfO 2)和与AlD沉积的金属氧化物层接触的溅射沉积的SiO x N y层(4)。 本发明还涉及适用于OLED基板的这种分层结构的制造方法。
Abstract:
본 발명은 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자에 관한 것으로서 더욱 상세하게는 유기발광소자와 접하는 면에 형성되는 주름구조 및 굴절률 차이가 극대화된 산란구조를 통해, 유기발광소자의 광추출 효율을 극대화시킬 수 있음은 물론, 양극산화와 습식코팅으로 이루어진 단순한 공정을 통해 제조 가능한 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자에 관한 것이다. 이를 위해, 본 발명은, 베이스 기판; 상기 베이스 기판 상에 형성되는 다수의 나노튜브; 및 상기 다수의 나노튜브 상에 형성되고, 상기 다수의 나노튜브의 상단을 밀폐하여, 상기 다수의 나노튜브 각각의 내부에 공기층을 형성시키며, 형성 시 상기 다수의 나노튜브에 의해 유도되는 모세관 현상에 의해 표면에 주름이 형성되어 있는 코팅막을 포함하는 것을 특징으로 하는 유기발광소자용 광추출 기판, 그 제조방법 및 이를 포함하는 유기발광소자를 제공한다.
Abstract:
The present invention relates to a process for producing a conductive translucent substrate for use in an organic light emitting diode, wherein a transparent electrode material is deposited on top of a scattering layer deposited on the transparent support, wherein the scattering layer comprises a base material having a first refractive index at a wavelength of emitted light of an organic LED element and a plurality of scattering materials provided in the inside of the base material and having a refractive index different from that of the base material, wherein the scattering material is deposited on the transparent support by deposition of a frit paste and heating the thus coated support to dry and fire the frit paste to form the scattering layer. As the electrode material use is made of F-doped SnO 2 , which is deposited by deposition and decomposition of a precursor at a temperature of between 500 and 650°C followed by cooling of the thus obtained conductive substrate. The present invention relates to a conductive translucent substrate.
Abstract:
The present invention provides an organic electronic element and an electronic apparatus using the same, wherein the organic electronic element comprises a compound represented by chemical formula 1, a first electrode, a second electrode, and an organic layer between the first electrode and the second electrode. The organic layer contains the compound represented by chemical formula 1, so that the light emission efficiency and lifespan of the element can be improved, and the driving voltage of the element can be lowered.
Abstract:
La présente invention concerne une électrode transparente supportée pour OLED, comprenant, successivement (i) un substrat transparent en verre minéral, (ii) une couche diffusante formée d'un émail haut indice contenant au moins 30 % en poids de Bi 2 O 3 , (iii) une couche barrière d'au moins un oxyde métallique diélectrique choisi dans le groupe constitué de Al 2 O 3 , TiO 2 , ZrO 2 et HfO 2 déposée par ALD, (iv) une couche d'un oxyde conducteur transparent (TCO). Elle concerne également un procédé de fabrication d'une telle électrode et une OLED comprenant une telle électrode.
Abstract translation:本发明涉及一种用于OLED的透明支撑电极,其连续包括:(i)矿物玻璃的透明基底,(ii)由含有至少30重量%Bi 2 O 3的高折射率搪瓷形成的散射层,(iii )选自由ALD沉积的Al 2 O 3,TiO 2,ZrO 2和HfO 2中的至少一种介电金属氧化物的阻挡层,以及(iv)透明导电氧化物层(TCO)。 本发明还涉及一种用于制造这种电极的方法和涉及包含这种电极的OLED。