化合物およびその製造方法、ポジ型レジスト組成物およびレジストパターン形成方法
    3.
    发明申请
    化合物およびその製造方法、ポジ型レジスト組成物およびレジストパターン形成方法 审中-公开
    化合物,其生产方法,阳性组合物和形成耐药性图案的方法

    公开(公告)号:WO2007034719A1

    公开(公告)日:2007-03-29

    申请号:PCT/JP2006/318151

    申请日:2006-09-13

    Abstract: Disclosed is a compound represented by the general formula (A-1) below (wherein R's respectively represent a hydrogen atom or an acid-cleavable dissolution inhibiting group, and at least one of them represents an acid-cleavable dissolution inhibiting group; R 11 -R 17 respectively represent an alkyl group having 1-10 carbon atoms or an aromatic hydrocarbon group and may include a heteroatom in the structure; g and j respectively represent an integer of not less than 1, k and q respectively represent an integer of not less than 0, and g + j + k + q is not more than 5; a represents an integer of 1-3; b represents an integer of not less than 1, l and m respectively represent an integer of not less than 0, and b + l + m is not more than 4; c represents an integer of not less than 1, n and o respectively represent an integer of not less than 0, and c + n + o is not more than 4; and A represents a group represented by the general formula (Ia) below, a group represented by the general formula (Ib) below or an alicyclic group).

    Abstract translation: 公开了由下述通式(A-1)表示的化合物(其中R分别表示氢原子或酸可裂解溶解抑制基团,并且其至少一个表示酸可裂解溶解抑制基团; R 0 > 11 17 分别表示具有1-10个碳原子的烷基或芳族烃基,并且可以在结构中包括杂原子; g和j分别表示不是整数 小于1,k和q分别表示不小于0的整数,g + j + k + q不大于5; a表示1-3的整数; b表示不小于1的整数, l和m分别表示不小于0的整数,b + 1 + m不大于4; c表示不小于1的整数,n和o分别表示不小于0的整数,c + n + o不大于4; A表示由以下通式(Ia)表示的基团 下述通式(Ib)或脂环基)。

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