強誘電体メモリ装置及びその製造方法
    1.
    发明申请
    強誘電体メモリ装置及びその製造方法 审中-公开
    电磁存储器件及其制造方法

    公开(公告)号:WO2003023858A1

    公开(公告)日:2003-03-20

    申请号:PCT/JP2002/009032

    申请日:2002-09-05

    CPC classification number: H01L27/11502 H01L27/11507 H01L28/55

    Abstract: A ferroelectric memory device comprises a first electrode 102, second electrodes 103 arrayed in a direction perpendicular to the first electrode 102, and a ferroelectric film 101 disposed at least in an intersection area of the first electrode 102 and the second electrodes 103. Capacitors constituted of the first electrode 102, the ferroelectric film 101, and the second electrodes 103 are arranged in a matrix. In the ferroelectric film 101, a ferroelectric phase and a paraelectric phase are mixedly present.

    Abstract translation: 铁电存储器件包括第一电极102,沿垂直于第一电极102的方向排列的第二电极103和至少设置在第一电极102和第二电极103的交叉区域中的铁电膜101.电容器由 第一电极102,铁电体膜101和第二电极103以矩阵形式布置。 在铁电体膜101中,混合存在铁电相和顺电相。

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