ABRASIVE ARTICLES AND METHODS FOR THE MANUFACTURE AND USE OF SAME
    1.
    发明申请
    ABRASIVE ARTICLES AND METHODS FOR THE MANUFACTURE AND USE OF SAME 审中-公开
    磨料制品及其制造方法和使用方法

    公开(公告)号:WO2003085595A1

    公开(公告)日:2003-10-16

    申请号:PCT/US2003/003775

    申请日:2003-02-07

    CPC classification number: B24D11/00

    Abstract: The invention provides an abrasive article (22, 122), and methods for the use and the manufacture of the article. The abrasive article comprises an abrasive surface (224); and a performance index associated with the abrasive article, the index indicating an aspect of the abrasive performance of the article. In abrasive applications, the performance index is used to determine initial process conditions under which the abrasive article (22, 122) will abrade a workpiece. A process for making the abrasive article comprises (a) providing an abrasive article (22, 122) having an abrasive surface (224); (b) providing a workpiece (30, 132) having an abradable surface thereon; (c) abrading the abradable surface by applying the abrasive surface (224) against the abradable surface at a known applied pressure and velocity and relatively moving the abrasive article (22, 122) and the abradable surface during a predetermined period of time; (d) devising a performance index based on the abrasive performance of the abrasive article during the abrading step (c); and (e) associating the performance index with the abrasive article (22, 122).

    Abstract translation: 本发明提供了一种磨料制品(22,122),以及用于使用和制造制品的方法。 磨料制品包括研磨表面(224); 以及与磨料制品相关联的性能指标,该指标表示制品的研磨性能的一个方面。 在磨料应用中,性能指数用于确定磨料制品(22,122)将磨损工件的初始工艺条件。 制造磨料制品的方法包括(a)提供具有研磨表面(224)的磨料制品(22,122); (b)提供其上具有可磨损表面的工件(30,132); (c)通过以已知的施加的压力和速度将研磨表面(224)施加到可磨损表面上并在预定时间段内相对移动磨料制品(22,122)和可磨损表面来研磨可磨损表面; (d)在研磨步骤(c)期间基于磨料制品的研磨性能设计性能指标; 和(e)将性能指标与磨料制品(22,122)相关联。

    LAPPING CARRIER AND METHOD OF USING THE SAME
    2.
    发明申请
    LAPPING CARRIER AND METHOD OF USING THE SAME 审中-公开
    搭接载体及其使用方法

    公开(公告)号:WO2013009685A1

    公开(公告)日:2013-01-17

    申请号:PCT/US2012/045926

    申请日:2012-07-09

    CPC classification number: B24B7/17 B24B37/04 B24B37/28

    Abstract: A lapping carrier includes a base having first and second opposed major surfaces and at least one aperture extending from the first major surface to the second major surface. A wear layer is disposed on the first major surface of the base. The wear layer includes an outer polymer layer comprising at least one of polyether ether ketone or ultrahigh molecular weight polyethylene, and a first adhesive layer disposed between the outer polymer layer and the base

    Abstract translation: 研磨载体包括具有第一和第二相对主表面的基部和从第一主表面延伸到第二主表面的至少一个孔。 耐磨层设置在基座的第一主表面上。 耐磨层包括包含聚醚醚酮或超高分子量聚乙烯中的至少一种的外部聚合物层,以及设置在外部聚合物层和基材之间的第一粘合剂层

    EXTENDED LIFE ABRASIVE ARTICLE AND METHOD
    3.
    发明申请
    EXTENDED LIFE ABRASIVE ARTICLE AND METHOD 审中-公开
    延长寿命磨砂文章和方法

    公开(公告)号:WO2008027714A1

    公开(公告)日:2008-03-06

    申请号:PCT/US2007/075791

    申请日:2007-08-13

    CPC classification number: B24D3/08 B23D61/18 B24B53/017 B24D11/00

    Abstract: Provided is an abrasive article comprising (a) a metallic foil having a first and second surfaces and voids therebetween, (b) a plurality of abrasive particles substantially in the voids, and (c) an alloy at least partially between the abrasive particles and the foil in the voids, wherein the alloy comprises a second component and a portion of the metallic foil near the voids. Also provided are methods of making and using such abrasive articles.

    Abstract translation: 提供了一种磨料制品,其包括(a)金属箔,其间具有第一和第二表面和空隙,(b)基本上在空隙中的多个磨料颗粒,和(c)至少部分地在磨料颗粒和 在所述空隙中形成箔,其中所述合金包括靠近所述空隙的第二部件和所述金属箔的一部分。 还提供了制造和使用这种磨料制品的方法。

    MODELING AN ABRASIVE PROCESS TO ACHIEVE CONTROLLED MATERIAL REMOVAL
    4.
    发明申请
    MODELING AN ABRASIVE PROCESS TO ACHIEVE CONTROLLED MATERIAL REMOVAL 审中-公开
    建立磨蚀过程,以实现控制材料的去除

    公开(公告)号:WO2004069477A1

    公开(公告)日:2004-08-19

    申请号:PCT/US2003/041302

    申请日:2003-12-23

    CPC classification number: B24B37/042 B24B49/16 B24B51/00

    Abstract: In general, techniques are described that allow an abrasive manufacturing process to achieve a controlled performance parameter, e.g., an amount of material removal, without requiring the use of feedback controls within the abrasive manufacturing process. For example, a system includes a machine to abrade a workpiece with an abrasive article, and a controller to control the application of the abrasive article to the workpiece by the machine to achieve a substantially constant cut rate for the abrasive article. The controller controls one or more process variables in accordance with an open-loop mathematical model that relates the cut rate of the abrasive article to an application force of the abrasive article to achieve controlled material removal. For example, a constant rate of cut can be achieved or a fixed amount of material can be removed while abrading one or more workpiece in accordance with the model.

    Abstract translation: 通常,描述了允许磨料制造工艺实现受控性能参数(例如,材料去除量)而不需要在磨料制造过程中使用反馈控制的技术。 例如,系统包括用磨料制品磨削工件的机器,以及控制器,用于通过机器控制磨料制品对工件的应用,以实现磨料制品的基本恒定的切削速度。 控制器根据开环数学模型控制一个或多个过程变量,该数学模型将磨料制品的切割速率与磨料制品的施加力相关联,以实现受控材料的去除。 例如,可以根据型号对一个或多个工件进行研磨,可以实现恒定的切割速度或固定量的材料。

    UNDULATED PAD CONDITIONER AND METHOD OF USING SAME
    6.
    发明申请
    UNDULATED PAD CONDITIONER AND METHOD OF USING SAME 审中-公开
    底盘式调节器及其使用方法

    公开(公告)号:WO2005095059A1

    公开(公告)日:2005-10-13

    申请号:PCT/US2005/002310

    申请日:2005-01-25

    CPC classification number: B24D9/08 B24B53/017

    Abstract: A pad conditioner having an abrasive disk (12) and an undulating disk (10) and methods for using the same. The undulating disk (10) has at least one raised portion (26) and at least one recessed portion (28). The abrasive disk (12) is releasably affixed to at least a portion of the recessed (28) portion to form an undulated abrasive surface (16). The undulating disk (10) allows the pad conditioner to be modified for use with multiple processes and for a variety of workpieces.

    Abstract translation: 具有研磨盘(12)和起伏盘(10)的垫调节器及其使用方法。 起伏盘(10)具有至少一个凸起部分(26)和至少一个凹陷部分(28)。 研磨盘(12)可释放地固定在凹入部分(28)的至少一部分上,以形成波浪的研磨表面(16)。 起伏盘(10)允许衬垫调节器被修改以用于多个工艺和各种工件。

    INSULATED PAD CONDITIONER AND METHOD OF USING SAME
    7.
    发明申请
    INSULATED PAD CONDITIONER AND METHOD OF USING SAME 审中-公开
    绝缘垫调节器及其使用方法

    公开(公告)号:WO2005095055A1

    公开(公告)日:2005-10-13

    申请号:PCT/US2005/002309

    申请日:2005-01-25

    CPC classification number: B24B53/017 B24B37/042 B24B37/046

    Abstract: A wafer planarization process with a conditioning tool (14) having an electrical insulator that electrically insulates the abrasive surface of the conditioning tool (14). The electrical insulator extends the useful life of the abrasive surface of the conditioning tool (14) by reducing the level of electrochemically driven corrosion.

    Abstract translation: 具有调节工具(14)的晶片平面化工艺,所述调节工具具有使所述调节工具(14)的磨料表面电绝缘的电绝缘体。 电绝缘体通过减少电化学驱动腐蚀的水平来延长调节工具(14)的研磨表面的使用寿命。

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