公开(公告)号：WO2020236240A1

公开(公告)日：2020-11-26

申请号：PCT/US2020/020200

申请日：2020-02-27

Applicant: APPLIED MATERIALS, INC.

Inventor： SHENG, Shuran ,  ZHANG, Lin ,  HUANG, Jiyong ,  WERNER, Joseph C. ,  WU, Stanley ,  KANAWADE, Mahesh Adinath ,  CHEN, Yikai ,  LIN, Yixing ,  MA, Ying

IPC: C23C16/458 ,  C23C16/44

Abstract: Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.