公开(公告)号：WO2022061023A1

公开(公告)日：2022-03-24

申请号：PCT/US2021/050728

申请日：2021-09-16

Applicant: APPLIED MATERIALS, INC.

Inventor： MERRY, Nir ,  WIRTH, Paul ,  XU, Ming ,  KOSHTI, Sushant ,  TAN, Raechel Chu-Hui

IPC: G01F1/84 ,  G01F15/00 ,  G05D7/06

Abstract: Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.

公开(公告)号：WO2023023001A1

公开(公告)日：2023-02-23

申请号：PCT/US2022/040374

申请日：2022-08-15

Applicant: APPLIED MATERIALS, INC.

Inventor： MEDURE, Robert A. ,  TAN, Raechel Chu-Hui ,  WANG, Changgong ,  GUO, Yuanhong ,  PADHY, Sai ,  OKADA, Ashley M. ,  LE, Kenneth ,  KILICARSLAN, Atilla ,  HRUZEK, Dean C.

IPC: H01L21/67

Abstract: Disclosed are implementations for minimizing substrate contamination during pressure changes in substrate processing systems. Over a duration of a pressure change (increase or decrease) in a chamber of a substrate processing system, a flow rate is adjusted multiple times to reduce occurrence of contaminant particles in an environment of the chamber. In some instances, the flow rate is changed continuously using at least one dynamic valve that enable continuous control over the pressure dynamics of the chamber.