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    METHODS, SYSTEMS, AND APPARATUS FOR MASS FLOW VERIFICATION BASED ON CHOKED FLOW
    1.
    发明申请
    METHODS, SYSTEMS, AND APPARATUS FOR MASS FLOW VERIFICATION BASED ON CHOKED FLOW 审中-公开
    基于CH流的质量流量验证方法，系统和设备

    公开(公告)号：WO2018004856A1

    公开(公告)日：2018-01-04

    申请号：PCT/US2017/033073

    申请日：2017-05-17

    Applicant: APPLIED MATERIALS, INC

    Inventor： BRASHEAR, Kevin M. ,  YE, Zhiyuan ,  HOUGH, Justin ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E. ,  OKADA, Ashley M.

    IPC: G01F25/00 ,  G05D7/06

    Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.

    Abstract translation: 质量流量验证系统和装置可以基于扼流流量原理来验证质量流量控制器（MFC）的质量流率。 这些系统和设备可以包括并联耦合的多个不同尺寸的流量限制器。 基于MFC的设定点，可以通过选择通过流量限制器之一的流动路径来验证宽范围的流量。 质量流量可以通过在扼流条件下流量限制器上游的压力和温度测量来确定。 还提供了基于阻塞流量原理验证质量流量的方法，以及其他方面。

    PRESSURE REGULATED FLOW CONTROLLER
    2.
    发明申请
    PRESSURE REGULATED FLOW CONTROLLER 审中-公开

    公开(公告)号：WO2021016538A1

    公开(公告)日：2021-01-28

    申请号：PCT/US2020/043447

    申请日：2020-07-24

    Applicant: APPLIED MATERIALS, INC.

    Inventor： XU, Ming ,  LE, Kenneth ,  OKADA, Ashley M.

    IPC: H01J37/32 ,  H01L21/67 ,  C23C16/455

    Abstract: Disclosed herein is an apparatus for controlling a flow rate of a gas including a flow restriction element configured to restrict a flow rate of a gas; a pressure regulator coupled to an inlet of the flow restriction element, wherein the pressure regulator is configured to control a pressure of the gas between the pressure regulator and the flow restriction element; a flow meter coupled to an outlet of the flow restriction element, wherein the flow meter is configured to measure the flow rate of the gas at an outlet of the flow restriction element; and a controller operatively coupled to the pressure regulator and the flow meter, wherein the controller is to receive a measurement of the flow rate by the flow meter, determine a pressure setting associated with a target flow rate, and cause the pressure regulator to have the pressure setting.

    METHODS AND ASSEMBLIES FOR GAS FLOW RATIO CONTROL
    3.
    发明申请
    METHODS AND ASSEMBLIES FOR GAS FLOW RATIO CONTROL 审中-公开

    公开(公告)号：WO2017160612A1

    公开(公告)日：2017-09-21

    申请号：PCT/US2017/021722

    申请日：2017-03-10

    Applicant: APPLIED MATERIALS, INC

    Inventor： BRASHEAR, Kevin ,  OKADA, Ashley M. ,  DEMARS, Dennis L. ,  YE, Zhiyuan ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E.

    IPC: H01L21/54 ,  H01L21/67

    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.

    METHODS AND ASSEMBLIES FOR GAS FLOW RATIO CONTROL
    5.
    发明申请
    METHODS AND ASSEMBLIES FOR GAS FLOW RATIO CONTROL 审中-公开
    用于气体流量比控制的方法和组件

    公开(公告)号：WO2017160614A1

    公开(公告)日：2017-09-21

    申请号：PCT/US2017/021724

    申请日：2017-03-10

    Applicant: APPLIED MATERIALS, INC

    Inventor： BRASHEAR, Kevin ,  OKADA, Ashley M. ,  DEMARS, Dennis L. ,  YE, Zhiyuan ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E.

    IPC: H01L21/54 ,  H01L21/67

    Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.

    Abstract translation: 方法和气体流量控制组件被配置成以期望的流量比将气体输送到处理室区域。 在一些实施例中，组件包括一个或多个MFC和背压控制器（BPC）。 组件包括控制器，处理气体供应，分配歧管，耦合到分配歧管并被配置为感测分配歧管的背压的压力传感器，处理室，连接在分配歧管和分配歧管之间的一个或多个质量流量控制器 处理腔室以控制其间的气体流动，以及与所述一个或多个质量流量控制器成流体并联关系地提供的背压控制器，其中实现精确的流量比控制。 可选实施例包括上游压力控制器，该上游压力控制器被构造成控制载气的流量以控制背压。 描述了用于控制区带气体流量比率的其他方法和组件以及其他方面。

    LOW TEMPERATURE THERMAL FLOW RATIO CONTROLLER
    7.
    发明申请
    LOW TEMPERATURE THERMAL FLOW RATIO CONTROLLER 审中-公开

    公开(公告)号：WO2021055993A1

    公开(公告)日：2021-03-25

    申请号：PCT/US2020/052001

    申请日：2020-09-22

    Applicant: APPLIED MATERIALS, INC.

    Inventor： KUTNEY, Michael ,  OKADA, Ashley M.

    IPC: H01J37/32 ,  C23C16/52

    Abstract: Methods and apparatus for a flow ratio controller are provided herein. In some embodiments, a flow ratio controller includes an inlet; a plurality of channels extending from the inlet to a corresponding plurality of outlets; a bypass pipe extending from each channel of the plurality of channels that diverts a small portion of a flow from that channel and then returns the small portion of the flow back to that channel; and a thermal mass flow meter coupled to the bypass pipe having a first temperature sensor, a second temperature sensor, and a heating element disposed therebetween. A controller is configured to determine a flow rate through each of the plurality of channels based on a measured temperature difference between the first temperature sensor and the second temperature sensor.

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