公开(公告)号：WO2019115218A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/082670

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： BROUNS, Derk, Servatius, Gertruda ,  ADAMS, Joshua ,  BENDIKSEN, Aage ,  JACOBS, Richard ,  JUDGE, Andrew ,  KOTTAPALLI, Veera, Venkata, Narasimha, Narendra, Phani ,  LYONS, Joseph, Harry ,  MODDERMAN, Theodorus, Marinus ,  RANJAN, Manish ,  VAN DE KERKHOF, Marcus, Adrianus ,  XIONG, Xugang

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: An apparatus for determining a condition associated with a pellicle (19) for use in a lithographic apparatus (LA), the apparatus comprising a sensor (26, 32, 52, 60), wherein the sensor (26, 32, 52, 60) is configured to measure a property associated with the pellicle (19), the property being indicative of the pellicle condition.

公开(公告)号：WO2020136013A1

公开(公告)日：2020-07-02

申请号：PCT/EP2019/084831

申请日：2019-12-12

Applicant: ASML HOLDING N.V.

Inventor： LOMBARDO, Jeffrey, John ,  ALBRIGHT, Ronald, Peter ,  HALL, Daniel, Leslie ,  PEREZ-FALCON, Victor, Antonio ,  JUDGE, Andrew

IPC: G03F7/20

Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.

公开(公告)号：WO2018046280A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070896

申请日：2017-08-18

Applicant: ASML HOLDING N.V.

Inventor： JUDGE, Andrew

IPC: G03F7/20 ,  H01L21/687

Abstract: A lithographic apparatus can include a stationary frame having a first electrical conductor, and a support structure configured to support an object. The support structure is movably coupled to the frame and has a second electrical conductor. The lithographic apparatus can also include a conductive fluid that electrically couples the first electrical conductor to the second electrical conductor.

Abstract translation: 光刻设备可以包括具有第一电导体的固定框架和被配置为支撑物体的支撑结构。 支撑结构可移动地连接到框架并具有第二电导体。 光刻设备还可以包括将第一电导体电耦合到第二电导体的导电流体。

公开(公告)号：WO2022017741A1

公开(公告)日：2022-01-27

申请号：PCT/EP2021/067913

申请日：2021-06-29

Applicant: ASML HOLDING N.V.

Inventor： JUDGE, Andrew ,  TARESH, Walter, Joseph ,  FIGUEROA, Dustin, Anthony

IPC: G03F7/20

Abstract: Embodiments herein describe systems, methods, and devices for thermal conditioning of reticles at a patterning device handling apparatus and a support structure in lithographic apparatuses. A patterning device handling apparatus includes a gripping device (510) with a plurality of pneumatic lines (530). The patterning device handling apparatus positions a first surface of a patterning device (502) below the gripping device, and the gripping device applies a first air flow to the patterning device using the plurality of pneumatic lines. The patterning device handling apparatus positions a second surface of the patterning device in the support structure. One or more vacuum pads (516) in clamping interfaces (506) in the support structure apply a second air flow (520) to the patterning device. The first and second air flows result in thermal conditioning of the patterning device.

公开(公告)号：WO2021213813A1

公开(公告)日：2021-10-28

申请号：PCT/EP2021/059243

申请日：2021-04-08

Applicant: ASML HOLDING N.V.

Inventor： JUDGE, Andrew ,  KALLURI, Ravi, Chaitanya ,  PAWLOWSKI, Michal, Emanuel ,  WALSH, James, Hamilton ,  KREUZER, Justin, Lloyd

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20

Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

公开(公告)号：WO2019015930A1

公开(公告)日：2019-01-24

申请号：PCT/EP2018/067361

申请日：2018-06-28

Applicant: ASML HOLDING N.V.

Inventor： JUDGE, Andrew ,  BENDIKSEN, Aage ,  RIZO DIAGO, Pedro, Julian

IPC: G03F7/20 ,  H01L21/683

Abstract: A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.