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公开(公告)号：WO2023041306A1
公开(公告)日：2023-03-23
申请号：PCT/EP2022/073709
申请日：2022-08-25
Applicant: ASML NETHERLANDS B.V.
Inventor： BRAAKSMA, Niels , LI, Tianqi , YAVUZ, Mehmet, Altug
Abstract: A protection apparatus (100) includes a buffer generator and a heating apparatus. The buffer generator is configured to interact a buffer with a surface of a substrate (130) that is positioned inside a chamber of an extreme ultraviolet (EUV) light source. The heating apparatus is in thermal communication with the substrate and is configured to increase a temperature of the substrate and the substrate surface.
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