公开(公告)号：WO2023041306A1

公开(公告)日：2023-03-23

申请号：PCT/EP2022/073709

申请日：2022-08-25

Applicant: ASML NETHERLANDS B.V.

Inventor： BRAAKSMA, Niels ,  LI, Tianqi ,  YAVUZ, Mehmet, Altug

IPC: H05G2/00 ,  G03F7/20

Abstract: A protection apparatus (100) includes a buffer generator and a heating apparatus. The buffer generator is configured to interact a buffer with a surface of a substrate (130) that is positioned inside a chamber of an extreme ultraviolet (EUV) light source. The heating apparatus is in thermal communication with the substrate and is configured to increase a temperature of the substrate and the substrate surface.

公开(公告)号：WO2019115144A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/081498

申请日：2018-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  DZIOMKINA, Nina, Vladimirovna ,  STEWART IV, John, Tom ,  LI, Tianqi

IPC: G01N29/02 ,  G01N29/036 ,  G01N21/15

CPC classification number: G01N29/022 ,  G01N29/036 ,  G01N2291/0256

Abstract: An apparatus includes: a vessel; a target delivery system that directs a target toward an interaction region in the vessel, the target including target matter that emits extreme ultraviolet light when in a plasma state; and a metrology apparatus. The metrology apparatus includes a measurement system having a measurement surface configured to measure a flux of target matter; and a regeneration tool configured to regenerate the measurement system. Regeneration includes: preventing the measurement surface from becoming saturated, and/or de-saturating the measurement surface if it has become saturated.