公开(公告)号：WO2018072980A1

公开(公告)日：2018-04-26

申请号：PCT/EP2017/074643

申请日：2017-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： KOU, Weitian ,  YPMA, Alexander ,  HAUPTMANN, Marc ,  KUPERS, Michiel ,  VERGAIJ-HUIZER, Lydia, Marianna ,  WALLERBOS, Erik, Johannes, Maria ,  DELVIGNE, Erik, Henri, Adriaan ,  ROELOFS, Willem, Seine, Christian ,  CEKLI, Hakki, Ergun ,  VAN DER SANDEN, Stefan, Cornelis, Theodorus ,  GROUWSTRA, Cédric, Désiré ,  DECKERS, David, Frans, Simon ,  GIOLLO, Manuel ,  DOVBUSH, Iryna

IPC: G03F7/70 ,  G03F7/20

Abstract: Disclosed is a method of determining a correction for a process parameter related to a lithographic process on a substrate and associated apparatuses. The lithographic process comprises a plurality of runs during each one of which a pattern is applied to one or more substrates. The method comprises obtaining pre-exposure metrology data describing a property of the substrate; obtaining post- exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning to the substrate, a group membership status from a one or more groups, based on said pre-exposure metrology data; and determining the correction for the process parameter based on said group membership status and said post-exposure metrology data.

Abstract translation: 公开了一种确定与衬底和相关装置上的光刻过程有关的过程参数的校正的方法。 光刻过程包括在其中每一个过程中将图案施加到一个或多个衬底的多次运行。 该方法包括获得描述衬底特性的预曝光度量数据; 获得曝光后测量数据，所述曝光后测量数据包括已经在一个或多个先前曝光的基板上执行的所述过程参数的一个或多个测量值; 基于所述预曝光度量数据向所述衬底分配来自一个或多个组的组成员身份状态; 以及基于所述组成员状态和所述曝光后测量数据确定对所述过程参数的校正。