公开(公告)号：WO2022106157A1

公开(公告)日：2022-05-27

申请号：PCT/EP2021/079524

申请日：2021-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： PARAYIL VENUGOPALAN, Syam ,  KURGANOVA, Evgenia ,  FARAMARZI, Vina

IPC: C23C16/04 ,  C23C16/48 ,  G03F7/004 ,  G03F7/16 ,  H01L21/02 ,  H01L21/027 ,  H01L29/739

Abstract: Methods of forming a patterned layer of material are disclosed. In one arrangement, a substrate having a layered structure is provided. The layered structure comprises a base layer, a support layer, and a thermally insulating layer between the base layer and the support layer. The support layer comprises a plurality of sub-units that are thermally insulated from each other. A selected portion of the support layer is selectively irradiated during a pattern-forming process. The irradiation locally drives the pattern-forming process to form a layer of material in a pattern defined by the selected portion.

公开(公告)号：WO2022058111A1

公开(公告)日：2022-03-24

申请号：PCT/EP2021/072787

申请日：2021-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： KURGANOVA, Evgenia ,  SCOTUZZI, Marijke ,  FARAMARZI, Vina ,  VAN DEN BROEK, Bastiaan, Maurice

IPC: G01N21/84 ,  G01N21/95

Abstract: Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.