公开(公告)号：WO2020212196A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/059859

申请日：2020-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BANERJEE, Nirupam ,  WRICKE, Sandro ,  BECKERS, Johan, Franciscus, Maria ,  DONKERBROEK, Arend, Johannes ,  GRIMM, Daniel ,  BRAKHAGE, Peter ,  RATHJE, Tim ,  TILKE, Martin

IPC: G03F7/20

Abstract: An image sensor (17) for immersion lithography, the image sensor comprising: a grating (310, 320 and 330); an absorber layer (350) on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating (400) at an upper surface of the image sensor; wherein a protective layer (500) is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.