公开(公告)号：WO2020212196A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/059859

申请日：2020-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BANERJEE, Nirupam ,  WRICKE, Sandro ,  BECKERS, Johan, Franciscus, Maria ,  DONKERBROEK, Arend, Johannes ,  GRIMM, Daniel ,  BRAKHAGE, Peter ,  RATHJE, Tim ,  TILKE, Martin

IPC: G03F7/20

Abstract: An image sensor (17) for immersion lithography, the image sensor comprising: a grating (310, 320 and 330); an absorber layer (350) on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating (400) at an upper surface of the image sensor; wherein a protective layer (500) is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

公开(公告)号：WO2018166738A1

公开(公告)日：2018-09-20

申请号：PCT/EP2018/053761

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： KLUGKIST, Joost, André ,  BANINE, Vadim, Yevgenyevich ,  BECKERS, Johan, Franciscus, Maria ,  JAMBUNATHAN, Madhusudhanan ,  NASALEVICH, Maxim, Aleksandrovich ,  NIKIPELOV, Andrey ,  STAS, Roland, Johannes, Wilhelmus ,  VLES, David, Ferdinand ,  WELTERS, Wilhelmus, Jacobus, Johannes ,  WRICKE, Sandro

IPC: G03F7/20 ,  G03F9/00 ,  G01J1/42

Abstract: A sensor mark (17) comprising: a substrate (200) having: a first deep ultra violet (DUV) absorbing layer (310, 320, 330) comprising a first material which substantially absorbs DUV radiation; a first protecting layer (600) comprising a second material; wherein: the first DUV absorbing layer has a first through hole (500) in it; the first protecting layer is positioned, in plan, in the first through hole (500) and the first protecting layer in the first through hole has a patterned region comprising a plurality of through holes (700); and the second material is more noble than the first material.

公开(公告)号：WO2020212000A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/055128

申请日：2020-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： DIKKEN, Dirk Jan, Willem ,  WRICKE, Sandro ,  BECKERS, Johan, Franciscus, Maria

IPC: G03F7/20 ,  G03F9/00

Abstract: The present invention provides a method of providing a pulsed radiation beam for exposing a first object and a second object in a lithographic apparatus. The method comprising providing the pulsed radiation beam at a first frequency for exposing the first object and providing the pulsed radiation beam at a second frequency for exposing the second object, wherein the first frequency is lower than the second frequency.

公开(公告)号：WO2018114229A1

公开(公告)日：2018-06-28

申请号：PCT/EP2017/080472

申请日：2017-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  BANINE, Vadim, Yevgenyevich ,  KLUGKIST, Joost, André ,  NASALEVICH, Maxim, Aleksandrovich ,  STAS, Roland, Johannes, Wilhelmus ,  WRICKE, Sandro

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer being greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.