公开(公告)号：WO2023016705A1

公开(公告)日：2023-02-16

申请号：PCT/EP2022/068625

申请日：2022-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN HAAF, Gijs ,  HAVIK, Niels ,  ROOZE, Joost ,  TRAN, Vu, Quang

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method for modeling alignment data over a substrate area relating to a substrate being exposed in a lithographic process. The method comprises obtaining alignment data relating to said substrate and separating the alignment data into a systematic component which is relatively stable between different substrates and a non-systematic component which is not relatively stable between different substrates. The systematic component and the non-systematic component are individually modeled and a process correction for the substrate determined based on the modeled systematic component and modeled non-systematic component.