公开(公告)号：WO2023016705A1

公开(公告)日：2023-02-16

申请号：PCT/EP2022/068625

申请日：2022-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN HAAF, Gijs ,  HAVIK, Niels ,  ROOZE, Joost ,  TRAN, Vu, Quang

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method for modeling alignment data over a substrate area relating to a substrate being exposed in a lithographic process. The method comprises obtaining alignment data relating to said substrate and separating the alignment data into a systematic component which is relatively stable between different substrates and a non-systematic component which is not relatively stable between different substrates. The systematic component and the non-systematic component are individually modeled and a process correction for the substrate determined based on the modeled systematic component and modeled non-systematic component.

公开(公告)号：WO2019206586A1

公开(公告)日：2019-10-31

申请号：PCT/EP2019/058335

申请日：2019-04-03

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： HUISMAN, Simon, Reinald ,  ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed ,  LIN, Yuxiang ,  TRAN, Vu, Quang ,  GOORDEN, Sebastianus, Adrianus ,  KREUZER, Justin, Lloyd ,  MASON, Christopher, John ,  AARTS, Igor, Matheus, Petronella ,  SHOME, Krishanu ,  TZEMAH, Irit

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.