公开(公告)号：WO2019201516A1

公开(公告)日：2019-10-24

申请号：PCT/EP2019/056224

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： YU, Miao ,  ARTS, Petrus, Martinus, Gerardus, Johannes ,  EUMMELEN, Erik, Henricus, Egidius, Catharina ,  GATTOBIGIO, Giovanni, Luca ,  HOLTRUST, Maarten ,  LEMPENS, Han, Henricus, Aldegonda ,  MIGCHELBRINK, Ferdy ,  POLET, Theodorus, Wilhelmus ,  TANASA, Gheorghe

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device comprising: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：WO2016177511A1

公开(公告)日：2016-11-10

申请号：PCT/EP2016/056758

申请日：2016-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  HOLTRUST, Maarten ,  VAN DUIJNHOVEN, Martinus ,  FAHRNI, Francis ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  QUIST, Anne, Willemijn, Bertine ,  PAARHUIS, Bart, Dinand ,  VAN SOMMEREN, Daan, Daniel, Johannes, Antonius

IPC: G03F7/20 ,  F01N1/02

CPC classification number: G03F7/70891 ,  G03F7/709

Abstract: A lithographic apparatus has: - a conduit through which a gas can flow; - a gas mover configured to cause the gas to flow in the conduit; - a wall in contact with the gas in the conduit and defining a membrane aperture therein; and - an acoustic filter comprising a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

Abstract translation: 光刻设备具有： - 气体可以通过该导管流动; - 构造成使气体在导管中流动的气体移动器; - 与管道中的气体接触并在其中限定膜孔的壁; 以及 - 包括固定在所述膜孔中的柔性膜的声学过滤器。 声学滤波器减少声学干扰的传播，而不增加任何流动阻力。