公开(公告)号：WO2022268679A1

公开(公告)日：2022-12-29

申请号：PCT/EP2022/066669

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HARTGERS, Albertus ,  STEEGHS, Marco, Matheus, Louis ,  SWINKELS, Gerardus, Hubertus, Petrus, Maria ,  IMPONENTE, Giovanni ,  PLANTZ, Nicholas, William, Maria ,  ENGELEN, Wouter, Joep ,  VAN DE KERKHOF, Marcus, Adrianus

IPC: G03F7/20 ,  G03F7/706

Abstract: A plate for use in an imaging system to determine two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate comprising a plurality of markers, wherein a first subset of the plurality of markers comprises a first type of markers for determining a first optical property of the illumination beam, a second subset of the plurality of markers comprises a second type of markers for determining a second optical property of the illumination beam, the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.

公开(公告)号：WO2021069147A1

公开(公告)日：2021-04-15

申请号：PCT/EP2020/074318

申请日：2020-09-01

Applicant: ASML NETHERLANDS B.V.

Inventor： IMPONENTE, Giovanni ,  ENGELEN, Wouter, Joep ,  PLANTZ, Nicholas, William, Maria

IPC: G03F7/20

Abstract: A substrate table configured to hold a substrate, comprising: a plurality of sensor elements configured to detect a radiation beam from a projection system, the radiation beam forming an illuminated region having an elongate shape at substrate level, the elongate shape having long edges and short edges and defining a longitudinal direction and a transverse direction perpendicular to the longitudinal direction, the sensor elements arranged along the longitudinal direction, wherein the plurality of the sensor elements are arranged at different distances in the transverse direction from one of the long edges of the elongate shape.

公开(公告)号：WO2019081167A1

公开(公告)日：2019-05-02

申请号：PCT/EP2018/076753

申请日：2018-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： FRISCO, Pierluigi ,  IMPONENTE, Giovanni ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A computer implemented method for calibrating a projection system model. The projection system model is configured to determine and output a set of optical element adjustments based upon a merit function, the merit function comprising a set of parameters and corresponding weights. The method comprises performing a merit function update process at each of a plurality of instances during processing of a lot, the lot comprising a plurality of wafers. The merit function update process outputs an updated merit function different to a current merit function.

公开(公告)号：WO2019042757A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/071981

申请日：2018-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： FRISCO, Pierluigi ,  IMPONENTE, Giovanni ,  DOWNES, James, Robert

IPC: G03F7/20

Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.

公开(公告)号：WO2017211538A1

公开(公告)日：2017-12-14

申请号：PCT/EP2017/061565

申请日：2017-05-15

Applicant: ASML NETHERLANDS B.V.

Inventor： IMPONENTE, Giovanni ,  FRISCO, Pierluigi

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70258 ,  G03F7/70483 ,  G03F7/70491 ,  G03F7/70525 ,  G03F7/706

Abstract: A projection system model is configured to predict optical aberrations of a projection system based upon a set of projection system characteristics and to determine and output a set of optical element adjustments based upon a merit function. The merit function comprises a set of parameters and corresponding weights. The method comprises receiving an initial merit function and executing an optimization algorithm to determine a second merit function. The optimization algorithm scores different merit functions based upon projection system characteristics of a projection system adjusted according to the output of the projection system model using a merit function having that set of parameters and weights.

Abstract translation: 投影系统模型被配置成基于一组投影系统特性来预测投影系统的光学像差并且基于优值函数来确定并输出一组光学元件调整。 评价函数包括一组参数和相应的权重。 该方法包括接收初始评价函数并执行优化算法以确定第二评价函数。 优化算法基于根据投影系统模型的输出调整的投影系统的投影系统特性使用具有该组参数和权重的评价函数评分不同的评价函数。

公开(公告)号：WO2016169890A1

公开(公告)日：2016-10-27

申请号：PCT/EP2016/058544

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  DE BUCK, Pieter, Bart, Aloïs ,  VANROOSE, Nico ,  IMPONENTE, Giovanni ,  STAS, Roland, Johannes, Wilhelmus ,  KAUR, Chanpreet ,  DOWNES, James, Robert

IPC: G03F7/20 ,  G01M11/02

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G01M11/0257 ,  G03F7/70866

Abstract: A method comprising illuminating a patterning device (ΜΑ') comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.

Abstract translation: 一种方法，包括照亮包括多个图案化区域（15a-15c）的图案形成装置（15a-15c），图案形成区域（15a-15c）中的每一个图案化测量光束（17a-17c），用投影系统（PL）将测量光束投射到 传感器装置（21），包括多个检测器区域（25a-25c），当图案形成装置和传感器装置位于第一相对构造中时，进行辐射的第一测量，移动图案形成装置和传感器中的至少一个 设备，以便将图案形成装置的相对配置改变为第二相对配置，当图案形成装置和传感器装置位于第二相对配置中时，对辐射进行第二测量，其中多个检测器区域 接收不同的测量光束到在第一相对配置中在相应检测器区域接收的测量光束并确定 由投影系统引起的像差。