公开(公告)号：WO2020064196A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/071544

申请日：2019-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： STOFFELS, Freerk, Adriaan ,  HARTGERS, Albertus

IPC: G03F7/20

Abstract: A method for determining at least a part of an angular intensity distribution of radiation at an object plane of an optical system, which may be referred to as an object level pupil shape, is disclosed. The method comprises directing the radiation onto a diffraction grating in the object plane so as to create at least one non-zeroth order diffraction beam which is at least partially received by the optical system; forming an image of a pupil plane of the optical system in a sensor plane and determining a spatial intensity distribution of radiation in the sensor plane; and determining at least a part of the angular intensity distribution of radiation at the object plane from the determined spatial intensity distribution of radiation in the sensor plane. The method is advantageous since it allows reconstruction of the angular intensity distribution of radiation at an object plane of an optical system, from a measurement at image plane level, even in situations where there is an obscuration of the pupil plane within the optical system.

公开(公告)号：WO2022199969A1

公开(公告)日：2022-09-29

申请号：PCT/EP2022/054615

申请日：2022-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： SOTIROPOULOS, Nikolaos ,  HARTGERS, Albertus ,  YPMA, Michael, Frederik ,  STEEGHS, Marco, Matheus, Louis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.

公开(公告)号：WO2022268679A1

公开(公告)日：2022-12-29

申请号：PCT/EP2022/066669

申请日：2022-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HARTGERS, Albertus ,  STEEGHS, Marco, Matheus, Louis ,  SWINKELS, Gerardus, Hubertus, Petrus, Maria ,  IMPONENTE, Giovanni ,  PLANTZ, Nicholas, William, Maria ,  ENGELEN, Wouter, Joep ,  VAN DE KERKHOF, Marcus, Adrianus

IPC: G03F7/20 ,  G03F7/706

Abstract: A plate for use in an imaging system to determine two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate comprising a plurality of markers, wherein a first subset of the plurality of markers comprises a first type of markers for determining a first optical property of the illumination beam, a second subset of the plurality of markers comprises a second type of markers for determining a second optical property of the illumination beam, the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.