公开(公告)号：WO2021013441A1

公开(公告)日：2021-01-28

申请号：PCT/EP2020/066871

申请日：2020-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  VAN DE MEERENDONK, Remco ,  BRUST, Steve, Gregory ,  JAKOBS, Dirk, Martinus, Gerardus, Petrus, Wilhelmus ,  KOTTAPALLI, Shravan

IPC: G03F7/20

Abstract: Disclosed herein is a passive flow induced vibration (FIV) reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system comprises: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that the compliance of the membrane reduces at least the low frequency FIVs in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit the extent of deflection of the membrane.