公开(公告)号：WO2023001480A1

公开(公告)日：2023-01-26

申请号：PCT/EP2022/067096

申请日：2022-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： LA FONTAINE, Bruno ,  DOU, Juying ,  DU, Zhidong ,  KUO, Che-Chia

IPC: H01J1/18 ,  H01J37/06

Abstract: Apparatuses and systems for stabilizing electron sources in charged particle beam inspection systems are provided. In some embodiments, a system may include an electron source comprising an emitting tip electrically connected to two electrodes and configured to emit an electron; and a base coupled to the emitting tip, wherein the base is configured to stabilize the emitting tip via the coupling.