公开(公告)号：WO2022002560A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/065676

申请日：2021-06-10

Applicant: ASML NETHERLANDS B.V.

Inventor： SIMMONS, Rodney, D ,  KAMBHAMPATI, Murali, Krishna ,  MITRY, Mark, Joseph ,  URONE, Dustin, Michael ,  LI, Shuqi ,  DONKER, Rilpho, Ludovicus ,  MCKENZIE, Paul, Alexander

IPC: G03F7/20 ,  G02B7/00 ,  H05G2/00 ,  G02B7/007 ,  G03F7/70033 ,  G03F7/70841 ,  G03F7/7085 ,  H05G2/005 ,  H05G2/008

Abstract: Systems, apparatuses, and methods are provided for optical metrology in an extreme ultraviolet (EUV) radiation system. An example system can include a metrology system and a window. An example metrology system can be configured to be disposed in a first environment and to perform one or more measurements of a region in a second environment along an optical axis of the metrology system. An example window can be configured to be disposed intersecting the optical axis and to isolate the metrology system from the second environment. The example window can be further configured to limit a transverse displacement from the optical axis to less than about ± 50 microns from a nominal transverse displacement from the optical axis at a primary focus of a radiation collector.