Abstract:
Systems, apparatuses, and methods are provided for optical metrology in an extreme ultraviolet (EUV) radiation system. An example system can include a metrology system and a window. An example metrology system can be configured to be disposed in a first environment and to perform one or more measurements of a region in a second environment along an optical axis of the metrology system. An example window can be configured to be disposed intersecting the optical axis and to isolate the metrology system from the second environment. The example window can be further configured to limit a transverse displacement from the optical axis to less than about ± 50 microns from a nominal transverse displacement from the optical axis at a primary focus of a radiation collector.
Abstract:
A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.