公开(公告)号：WO2019072704A1

公开(公告)日：2019-04-18

申请号：PCT/EP2018/077102

申请日：2018-10-05

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Fei ,  FANG, Wei ,  LIU, Kuo-Shih

IPC: H01J37/22 ,  H01J37/28

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. A charged particle beam apparatus generates a beam for imaging a first area 540 and a second area 541-547. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：WO2019063532A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075930

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Kuo-Shih ,  LIU, Xuedong ,  FANG, Wei ,  JAU, Jack

IPC: H01J37/22 ,  H01J37/28

Abstract: Disclosed herein is a method comprising: generating a plurality of probe spots (310A-310C) on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region (300) on the sample, recording from the plurality of probe spots a plurality of sets of signals respectively representing interactions of the plurality of beams of charged particles and the sample; generating a plurality of images (361-363) of the region (300) respectively from the plurality of sets of signals; and generating a composite image of the region from the plurality of images.