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公开(公告)号：WO2019072704A1
公开(公告)日：2019-04-18
申请号：PCT/EP2018/077102
申请日：2018-10-05
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Fei , FANG, Wei , LIU, Kuo-Shih
Abstract: Systems and methods for conducting critical dimension metrology are disclosed. A charged particle beam apparatus generates a beam for imaging a first area 540 and a second area 541-547. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.
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