METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION
    1.
    发明申请
    METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION 审中-公开
    用于模式校正和验证的方法和装置

    公开(公告)号:WO2017060192A1

    公开(公告)日:2017-04-13

    申请号:PCT/EP2016/073554

    申请日:2016-10-03

    CPC classification number: G03F1/36 G03F7/70441 G03F7/705 G03F7/70625

    Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.

    Abstract translation: 一种方法,包括提供出现在一个或多个图形化工艺衬底的一个或多个图像中的多个量规图案的多个单位单元,每个单位单元表示多个量规图案的量规图案的实例,使图像信息平均化 以达到量规图形的合成表示,并且基于合成表示确定量规图案的几何尺寸。

    A CHARGED PARTICLE BEAM SYSTEM FOR SCANNING A SAMPLE

    公开(公告)号:WO2020141094A1

    公开(公告)日:2020-07-09

    申请号:PCT/EP2019/086484

    申请日:2019-12-19

    Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

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