公开(公告)号：WO2020141094A1

公开(公告)日：2020-07-09

申请号：PCT/EP2019/086484

申请日：2019-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LYONS, Adam ,  WALLOW, Thomas I.

IPC: H01J37/28 ,  G01N23/2251 ,  G01R31/28 ,  G01R31/307

Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

公开(公告)号：WO2017114725A1

公开(公告)日：2017-07-06

申请号：PCT/EP2016/082227

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： TEL, Wim, Tjibbo ,  WALLOW, Thomas I.

IPC: G03F1/36 ,  G03F1/70 ,  G03F1/80 ,  G06F17/50 ,  H01L21/033 ,  H01L21/311

CPC classification number: G03F1/36 ,  G03F1/80 ,  G06F17/5068 ,  G06F2217/12 ,  H01L21/0334

Abstract: Provided is a process including: obtaining a layout specifying, at least in part, a pattern to be transferred to a substrate via a patterning process and an etch process; and modifying, with one or more processors, the layout to include an etch-assist feature that is larger than a resolution limit of the patterning process and smaller than a resolution limit of the etch process, the etch-assist feature being configured to reduce a bias of the patterning process or the etch process, to reduce an etch induced shift of a feature in the layout due to the etch process, or to expand a process window of another patterning process.

Abstract translation: 提供一种处理，包括：获得至少部分地指定要通过图案化处理和蚀刻处理转移到衬底的图案的布局; 以及利用一个或多个处理器修改所述布局以包括蚀刻辅助特征，所述蚀刻辅助特征大于所述图案化工艺的分辨率极限且小于所述蚀刻工艺的分辨率极限，所述蚀刻辅助特征被配置为减少 图案化工艺或蚀刻工艺的偏压，以减少由蚀刻工艺引起的布局中的特征的蚀刻引起的移位，或者扩大另一图案化工艺的工艺窗口。

公开(公告)号：WO2019145278A1

公开(公告)日：2019-08-01

申请号：PCT/EP2019/051461

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： CAO, Yu ,  WALLOW, Thomas I. ,  ZHANG, Chen ,  WANG, Jen-Shiang

IPC: G03F7/20

Abstract: Systems, methods, and programming are described herein for pre-scan feature determination. In one embodiment, image data representing a plurality of scanning electron microscope ("SEM") images may be obtained, each including a representation of a feature and each being associated with a respective scan of the feature by an SEM. For each image, a parameter associated with each of a plurality of gauge positions may be determined. A change in the parameter from each SEM image to a subsequent SEM image may be determined. For each gauge position, a rate of change for the parameter may be determined based on a difference in a location of the parameter between at least two of the plurality of SEM images. Feature data representing a reconstruction of the feature prior to the SEM being applied may be generated by extrapolating an original location of the parameter based on the parameter's rate of change.

公开(公告)号：WO2017102336A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/079336

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Jun ,  WALLOW, Thomas I. ,  LAENENS, Bart ,  PENG, Yi-Hsing

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/705

Abstract: A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.

Abstract translation: 一种方法，包括：获得用于图案化过程的多个规格图案的多个规格，每个规格图案被配置用于当作为图案化过程的一部分而被创建时测量该图案化过程的参数;以及 从所述多个计量器中创建一个或多个计量器的选择，其中如果存在所述计量器和所有其他计量器（如果有的话）的相同计量器模式或所有所述一个或多个计量器 与量规相连的相同量规图案，通过量规印刷适性检查。

公开(公告)号：WO2017060192A1

公开(公告)日：2017-04-13

申请号：PCT/EP2016/073554

申请日：2016-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： WALLOW, Thomas I. ,  YANG, Peng-cheng ,  LYONS, Adam ,  SHAYEGAN SALEK, Mir Farrokh ,  DILLEN, Hermanus, Adrianus

IPC: G03F7/20 ,  G03F1/36

CPC classification number: G03F1/36 ,  G03F7/70441 ,  G03F7/705 ,  G03F7/70625

Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.

Abstract translation: 一种方法，包括提供出现在一个或多个图形化工艺衬底的一个或多个图像中的多个量规图案的多个单位单元，每个单位单元表示多个量规图案的量规图案的实例，使图像信息平均化 以达到量规图形的合成表示，并且基于合成表示确定量规图案的几何尺寸。