公开(公告)号：WO2022189250A1

公开(公告)日：2022-09-15

申请号：PCT/EP2022/055393

申请日：2022-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： VON FINCK, Alexander ,  HALM, Simon ,  MARKEL, Ingo ,  NEUMANN, Maciej

IPC: G01B11/30 ,  H01L21/67 ,  H01L21/68 ,  H01L21/683 ,  G01N21/47 ,  G01N21/88

Abstract: A measuring apparatus (100) which is configured for roughness and/or defect measurement on a plurality of surface sections (2) of a surface of a sample (1) to be investigated comprises an illumination device (10) having at least two light sources (11A, 11B, 11C, 11D) which are arranged for illuminating a measuring region (3) of the surface with measuring light, a detector device (20) having a detector array (21) with a plurality of detector pixels which are arranged for capturing scattered light scattered at the surface, and an evaluation device (30) which is configured for determining at least one roughness feature of the surface, from the captured scattered light, the at least two light sources (11A, 11B, 11C, 11D) being configured for illuminating the measuring region (3) along at least two illumination beam paths (LA, LB, LC, LD) at different angles of incidence relative to a surface normal of the surface, the at least two light sources (11A, 11B, 11C, 11D) being able to be fixed with respect to the detector device (20), the detector device (20) being provided with imaging optics (22) arranged for imaging the measuring region (3) of the surface on the detector array (21), the detector device (20) being configured for detecting at least two scattered light images (4A, 4B, 4C, 4D) of surface sections (2) in the illuminated measuring region (3) at a predetermined viewing angle relative to the surface normal of the surface, portions of the scattered light received by the detector pixels, which portions are formed in each case by the illumination in one of the illumination beam paths (LA, LB, LC, LD), in each case having a common spatial frequency, and the evaluation device (30) being configured for determining the at least one roughness feature of the surface sections (2) from the at least two scattered light images (4A, 4B, 4C, 4D). A method for roughness and/or defect measurement is also described.