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1.发明申请
公开(公告)号：WO2020069001A1
公开(公告)日：2020-04-02
申请号：PCT/US2019/052985
申请日：2019-09-25
Applicant: ASML NETHERLANDS B.V.
Inventor： TREES, Dietmar, Uwe, Herbert , MUSHI, Simon, Romeo, Estomih , SAMS, Benjamin, Andrew , MEDINA OSEGUERA, Alfonso , DRIESSEN, Theodorus, Wilhelmus
IPC: H05G2/00
Abstract: Apparatus for and method of controlling introduction of EUV target material into an EUV chamber in which the EUV target material is selectively prevented from entering the EUV chamber when the EUV target material is not needed for the formation of a plasma in the EUV chamber such as during periods when a dispenser of the EUV material is initially started or is being tuned.
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