公开(公告)号：WO2017151288A1

公开(公告)日：2017-09-08

申请号：PCT/US2017/017240

申请日：2017-02-09

Applicant: ASML NETHERLANDS B.V.

Inventor： BAUMGART, Peter Michael ,  RAJYAGURU, Chirag ,  SAMS, Benjamin Andrew ,  RIDINGER, Armin Bernard ,  KARDOKUS, Janine Kiyabu ,  VASCHENKO, Georgiy O.

IPC: C01G19/02 ,  C22B7/04 ,  C22B25/08 ,  G21K5/08

Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with, one end of the vacuum port. A method and apparatus for purifying target material also are described.

Abstract translation: 用于净化EUV光源的靶材的脱氧系统包括具有中心区域和用于以均匀方式加热中心区域的加热器的炉子。 将容器插入炉子的中心区域，并将坩埚置于容器内。 封闭装置覆盖容器的开口端以形成具有真空和压力能力的密封件。 该系统还包括气体输入管，气体排出管和真空端口。 气体供应网络与气体输入管的一端流动连通地连接，并且气体供应网络与气体排出管的一端流体连通地连接。 真空网络与真空端口的一端流体连通地连接。 还描述了用于纯化目标材料的方法和设备。

公开(公告)号：WO2022063509A2

公开(公告)日：2022-03-31

申请号：PCT/EP2021/073421

申请日：2021-08-24

Applicant: ASML NETHERLANDS B.V.

Inventor： KAPADIA, Rahul, Sunil ,  RAJYAGURU, Chirag ,  LEENDERS, Martinus, Hendrikus, Antonius ,  KOWALK, Stephen, William ,  VASCHENKO, Georgiy, Olegovich

IPC: H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: A pressure relief apparatus includes a pressure relief component formed of a compressible material and disposed at an interior surface of a structure within a target material supply system. The target material supply system is configured to deliver target material. The interior surface of the structure defines a cavity within the target material supply system. The structure is formed of a rigid material, and is configured to contain the target material within the cavity. The pressure relief component is configured to passively prevent a pressure in the cavity from exceeding a maximum allowed value.

公开(公告)号：WO2022002662A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/066798

申请日：2021-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ERSHOV, Alexander, Igorevich ,  RAJYAGURU, Chirag ,  TREES, Dietmar, Uwe, Herbert ,  LUKENS, Joshua, Mark ,  DRIESSEN, Theodorus, Wilhelmus ,  RAFAC, Robert, Jay ,  VASCHENKO, Georgiy, Olegovich

IPC: H05G2/00 ,  H05G2/006 ,  H05G2/008

Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.

公开(公告)号：WO2020092162A1

公开(公告)日：2020-05-07

申请号：PCT/US2019/058110

申请日：2019-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： VASCHENKO, Georgiy Olegovich ,  RAJYAGURU, Chirag ,  ERSHOV, Alexander Igorevich ,  LUKENS, Joshua Mark ,  ABRAHAM, Mathew Cheeran ,  ROLLINGER, Bob

IPC: H05G2/00

Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

公开(公告)号：WO2016073190A1

公开(公告)日：2016-05-12

申请号：PCT/US2015/056515

申请日：2015-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： RAJYAGURU, Chirag ,  ALGOTS, John, Martin ,  ISHIKAWA, Tetsuya ,  BAUMGART, Peter, Michael

IPC: G21K5/04

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.

Abstract translation: 公开了一种EUV光源目标材料处理系统，其包括目标材料分配器和目标材料储存库，其中通过使用感应加热将目标材料储存库中的固体目标材料转化为液体形式的目标材料。