公开(公告)号：WO2022008145A1

公开(公告)日：2022-01-13

申请号：PCT/EP2021/065212

申请日：2021-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： HAGHI, Poorya ,  MCGROGAN, Sean W. ,  JACQUES, Robert N. ,  RIGGS, Daniel, Jason ,  MATTHES, Liane, Manuela

IPC: H05G2/00

Abstract: Systems, apparatuses, and methods are provided for steering aligning a laser beam and a fuel target. An example method can include generating, at a first rate, first sensing data indicative of a first overlap between a fuel target and a laser beam. The example method can further include generating, at a second rate, second sensing data indicative of a second overlap between the fuel target and the laser beam. The method can further include generating, at a third rate, and based on the first sensing data and the second sensing data, a steering control signal configured to steer the laser beam or the fuel target. In some aspects, the second rate can be different from the first rate, and the third rate can be about equal to the first rate. In other aspects, the first rate and the second rate can be about equal to the third rate.

公开(公告)号：WO2017087169A1

公开(公告)日：2017-05-26

申请号：PCT/US2016/059950

申请日：2016-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： RIGGS, Daniel, Jason

IPC: A61N5/06

CPC classification number: H05G2/008 ,  H05G2/00 ,  H05G2/001 ,  H05G2/003 ,  H05G2/005

Abstract: In LPP EUV systems, sinusoidal oscillations or instabilities can occur m the generated EUV energy. This is avoided by detecting when the LPP EUV system is approaching such instability and adjusting the LPP EUV system by moving the laser beam of the LPP EUV sysiem. Detection is done by determining when the generated EUV energy is at or above a primary threshold. Adjusting the LPP EUV system by moving the laser beam is done for a fixed period of time, until a subsequently generated EUV energy is below the primary threshold, until a subsequently generated EUV energy is below the primary threshold for a fixed period of time, or until a subsequently generated EUV energy is at or below a secondary threshold below the primary threshold.

Abstract translation: 在LPP EUV系统中，在产生的EUV能量中可能出现正弦振荡或不稳定性。 这通过检测LPP EUV系统何时接近这种不稳定性并通过移动LPP EUV系统的激光束来调整LPP EUV系统来避免。 通过确定生成的EUV能量何时处于或高于主要阈值来完成检测。 通过移动激光束来调整LPP EUV系统在固定时间段内完成，直到随后生成的EUV能量低于主阈值，直到随后生成的EUV能量在一个固定时间段内低于主阈值，或者 直到随后产生的EUV能量处于或低于低于主阈值的次级阈值为止。

公开(公告)号：WO2023285108A1

公开(公告)日：2023-01-19

申请号：PCT/EP2022/067326

申请日：2022-06-24

Applicant: ASML NETHERLANDS B.V.

Inventor： URONE, Dustin, Michael ,  DRIESSEN, Theodorus, Wilhelmus ,  RIGGS, Daniel, Jason ,  SIMMONS, Rodney, D ,  BANKHEAD, Jaden, Robert ,  MCKENZIE, Paul, Alexander

IPC: H05G2/00

Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.

公开(公告)号：WO2021122341A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/085656

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： RIGGS, Daniel, Jason ,  MATTHES, Liane, Manuela ,  DONKER, Rilpho, Ludovicus ,  LEENDERS, Martinus, Hendrikus, Antonius

IPC: G03F7/20 ,  G02B26/08 ,  H05G2/00 ,  G02B5/0891 ,  G03F7/70033 ,  G03F7/70041 ,  H05G2/003 ,  H05G2/008

Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.

公开(公告)号：WO2017027566A1

公开(公告)日：2017-02-16

申请号：PCT/US2016/046301

申请日：2016-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： RAFAC, Robert, Jay ,  RIGGS, Daniel, Jason

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/08 ,  H01S3/09 ,  H01S3/102 ,  H01S3/115 ,  H01S3/117

CPC classification number: H05G2/008 ,  H05G2/005

Abstract: A method includes providing a target, material that, comprises a component that emits extreme ultraviolet (EUV ) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

Abstract translation: 一种方法包括提供目标材料，其包含当转换成等离子体时发射极紫外（EUV）光的组分; 将第一辐射束引导到目标材料以将能量传递到目标材料以改变目标材料的几何分布以形成修改的靶; 将第二射束照射到修改的目标物上，第二辐射束将至少部分改性靶转换成发射EUV光的等离子体; 测量与所述目标材料和所述修改的目标物中的一种或多种相对于所述第一辐射束相关联的一个或多个特性; 以及基于所述一个或多个测量特性将预定辐射量从所述第一射线辐射传送到预定能量范围内。