公开(公告)号：WO2019122250A1

公开(公告)日：2019-06-27

申请号：PCT/EP2018/086415

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： KOOIMAN, Marleen ,  RIO, David, Marie ,  WUISTER, Sander, Frederik

IPC: G03F7/20

Abstract: Described herein is a method for calibrating a resist model. The method includes the steps of: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.