公开(公告)号：WO2022083954A1

公开(公告)日：2022-04-28

申请号：PCT/EP2021/075812

申请日：2021-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： DE NIVELLE, Martin, Jules, Marie-Emile ,  SELEN, Jori ,  BONTEKOE, Marcel ,  TORUMBA, Doru, Cristian

IPC: G03F9/00 ,  G03F7/20

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the substrate; a projection system configured to pattern the substrate with fields aligned in a scanning exposure direction; a level sensor configured to sense a height of the substrate using a plurality of measurement spots; and a controller configured to control the actuators to generate strokes of relative movement between the substrate and the level sensor for mapping the height of the substrate, said strokes being at an angle of less than 20 degrees relative to the scanning exposure direction. Also disclosed is an associated method of mapping the height of a substrate.