公开(公告)号：WO2022083954A1

公开(公告)日：2022-04-28

申请号：PCT/EP2021/075812

申请日：2021-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： DE NIVELLE, Martin, Jules, Marie-Emile ,  SELEN, Jori ,  BONTEKOE, Marcel ,  TORUMBA, Doru, Cristian

IPC: G03F9/00 ,  G03F7/20

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the substrate; a projection system configured to pattern the substrate with fields aligned in a scanning exposure direction; a level sensor configured to sense a height of the substrate using a plurality of measurement spots; and a controller configured to control the actuators to generate strokes of relative movement between the substrate and the level sensor for mapping the height of the substrate, said strokes being at an angle of less than 20 degrees relative to the scanning exposure direction. Also disclosed is an associated method of mapping the height of a substrate.

公开(公告)号：WO2013079316A2

公开(公告)日：2013-06-06

申请号：PCT/EP2012/072497

申请日：2012-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius ,  BONTEKOE, Marcel ,  PEETERS, Patrick

IPC: G03F7/20

CPC classification number: G06K15/1836 ,  G03F7/70291 ,  G03F7/70508

Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation comprises primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.

Abstract translation: 一种用于转换用于曝光设备，光刻或曝光设备的期望设备图案的向量表示的方法，向可编程图案形成设备提供数据的设备和方法以及设备制造方法。 在一个实施例中，用于转换的方法输出对应于期望的设备图案的期望的辐射剂量图案的光栅化表示，其中基于矢量的表示包括识别一个或多个基本图案的原始数据; 以及实例数据，其识别如何从每个识别的原始图案的一个或多个实例形成期望的设备图案的至少一部分，该方法包括形成在原始数据中标识的每个基元图案的光栅化图元，以及通过 存储与对应于该光栅化图元的实例数据相关联的每个光栅化图元。