公开(公告)号：WO2022199969A1

公开(公告)日：2022-09-29

申请号：PCT/EP2022/054615

申请日：2022-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： SOTIROPOULOS, Nikolaos ,  HARTGERS, Albertus ,  YPMA, Michael, Frederik ,  STEEGHS, Marco, Matheus, Louis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.